Ethylene

Ethylene

SCHEMBL28046221

C=C.CO[Si](CCCNCCN)(OC)OCCc1ccccc1

nearest known ligand 0.44

Full drug profile on Sugi Atlas →

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 9/20 0.41
DRD2 P14416 2/20 0.40
DRD4 P21917 2/20 0.40
DRD3 P35462 2/20 0.40
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1603369 0.97 SIGMAR1 (0.44) SIGMAR1DRD2DRD4DRD3MEN1
Heptane SCHEMBL28860810 0.90 SIGMAR1 (0.48) SIGMAR1DRD2DRD4DRD3
SCHEMBL447454 0.87 DRD2 (0.46) SIGMAR1DRD2DRD4DRD3MEN1
SCHEMBL28175344 0.86 SIGMAR1 (0.44) SIGMAR1DRD2DRD4DRD3
SCHEMBL37761 0.85 SIGMAR1 (0.42) SIGMAR1DRD2DRD4DRD3
SCHEMBL614447 0.85 MAOA (0.46)
SCHEMBL28789259 0.83 SIGMAR1 (0.39) SIGMAR1DRD2DRD4DRD3MEN1
SCHEMBL31028360 0.81 MEN1 (0.42) SIGMAR1MEN1KMT2A
SCHEMBL9762762 0.81 LMNA (0.36) DRD2DRD4DRD3MEN1KMT2A
SCHEMBL5203912 0.81 MAOA (0.45) SIGMAR1DRD4MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105324211-B Abrasive particles, method of making abrasive particles, and abrasive articles 3M创新有限公司 2018-10-16 CN disclosed
CN-107667009-A Compressible multi-layer product and preparation method thereof 3M创新有限公司 2018-02-06 CN disclosed
CN-107531026-A With reference to the product of discrete elastomeric characteristic structure 3M创新有限公司 2018-01-02 CN disclosed
CN-107531005-A Compressible multilayer article and method of making same 3M创新有限公司 2018-01-02 CN disclosed
CN-105324211-A Abrasive particles, method of making abrasive particles, and abrasive articles 3M INNOVATIVE PROPERTIES CO 2016-02-10 CN disclosed