Naphthalene

Naphthalene

SCHEMBL28055830

CCc1ccccc1[SiH](Cl)Cl.c1ccc2ccccc2c1

nearest known ligand 0.38

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 1/20 0.38
CYP2A6 P11509 2/20 0.38
CYP1A2 P05177 2/20 0.38
GABRA1 P14867 4/20 0.37
GABRB2 P47870 4/20 0.37
MAPT P10636 2/20 0.34
KDM4E B2RXH2 1/20 0.34
ALDH1A1 P00352 1/20 0.34
ALOX12 P18054 1/20 0.33
LMNA P02545 1/20 0.33
NPSR1 Q6W5P4 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
DAO P14920 1/20 0.32
TP53 P04637 1/20 0.31
CSNK2A2 P19784 1/20 0.31
CSNK2B P67870 1/20 0.31
CSNK2A1 P68400 1/20 0.31
CSNK2A3 Q8NEV1 1/20 0.31
CYP2D6 P10635 2/20 0.31
CYP2C19 P33261 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL115194 0.94 MGLL (0.42) MGLLGABRA1GABRB2MAPTALDH1A1
SCHEMBL11128898 0.84 MGLL (0.36) MGLLGABRA1GABRB2MAPTALDH1A1
SCHEMBL21383150 0.78 GABRA1 (0.39) MGLLGABRA1GABRB2MAPTALDH1A1
SCHEMBL3482512 0.77 LIPG (0.33) MGLLMAPTKDM4EALDH1A1LMNA
SCHEMBL11528209 0.75 GABRA1 (0.37) MGLLGABRA1GABRB2MAPTALDH1A1
SCHEMBL27943154 0.73 GABRA1 (0.35) MGLLGABRA1GABRB2MAPTNPSR1
SCHEMBL3482161 0.73 LIPG (0.43) CYP2D6
SCHEMBL20637440 0.73 GABRA1 (0.42) MGLLGABRA1GABRB2MAPTALDH1A1
SCHEMBL1262668 0.73 ALDH1A1 (0.39) ALDH1A1
SCHEMBL975133 0.72 LIPG (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105418927-A Low dielectric constant material film and preparation method thereof SHANGHAI ADVANCED RES INST CAS 2016-03-23 CN disclosed
CN-105418926-A Fluorine-containing naphthalene ethyl silicon resin, preparation method and applications thereof SHANGHAI ADVANCED RES INST CAS 2016-03-23 CN disclosed