SCHEMBL28068262

SCHEMBL28068262

CCCC(=O)OC(=O)c1ccc2ccccc2c1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 3/20 0.55
RAB9A P51151 3/20 0.55
SMN1; SMN2 Q16637 2/20 0.55
ALDH1A1 P00352 1/20 0.55
HPGD P15428 2/20 0.50
KDM4E B2RXH2 1/20 0.50
HDAC3 O15379 2/20 0.49
HDAC1 Q13547 2/20 0.49
HDAC2 Q92769 2/20 0.49
CES2 O00748 1/20 0.49
CES1 P23141 1/20 0.49
MEN1 O00255 1/20 0.47
KMT2A Q03164 1/20 0.47
PTPN1 P18031 1/20 0.46
HRH3 Q9Y5N1 2/20 0.46
GMNN O75496 1/20 0.45
LMNA P02545 1/20 0.45
CYP1A2 P05177 1/20 0.45
CYP3A4 P08684 1/20 0.45
ALOX15 P16050 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16856755 0.89 SMN1; SMN2 (0.55) NPC1RAB9ASMN1; SMN2ALDH1A1HPGD
SCHEMBL777802 0.81 CES2 (0.65) NPC1RAB9ASMN1; SMN2ALDH1A1HPGD
SCHEMBL29459735 0.81 CES2 (0.65) NPC1RAB9ASMN1; SMN2ALDH1A1HPGD
SCHEMBL20485512 0.81 ALDH1A1 (0.58) NPC1RAB9ASMN1; SMN2ALDH1A1HPGD
Hydrogen Peroxide SCHEMBL29219018 0.80 LMNA (0.56) SMN1; SMN2ALDH1A1HPGDCES2CES1
SCHEMBL266279 0.80 LMNA (0.56) SMN1; SMN2ALDH1A1HPGDCES2CES1
SCHEMBL5986576 0.80 CES2 (0.44) NPC1RAB9ASMN1; SMN2ALDH1A1HPGD
SCHEMBL7929773 0.78 CES2 (0.57) NPC1RAB9ASMN1; SMN2ALDH1A1HPGD
SCHEMBL30848559 0.78 SMN1; SMN2 (0.73) NPC1RAB9ASMN1; SMN2ALDH1A1HPGD
SCHEMBL4108418 0.78 SMN1; SMN2 (0.73) NPC1RAB9ASMN1; SMN2ALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111240156-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2020-06-05 CN disclosed
CN-105566110-A Synthesis method of polysubstituted 1-naphthol and derivatives thereof UNIV NANKAI 2016-05-11 CN disclosed