SCHEMBL28114918

SCHEMBL28114918

C=C(C(=O)OCCC)S(=O)(=O)c1ccccc1C

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.41
LMNA P02545 4/20 0.41
GAA P10253 4/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
RAPGEF4 Q8WZA2 1/20 0.38
MAPT P10636 1/20 0.37
DHODH Q02127 1/20 0.37
MAPK1 P28482 1/20 0.36
CYP1A2 P05177 1/20 0.36
CYP3A4 P08684 1/20 0.36
CYP2D6 P10635 1/20 0.36
CYP2C9 P11712 1/20 0.36
CYP2C19 P33261 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
ALOX12 P18054 1/20 0.35
HTT P42858 1/20 0.35
POLB P06746 1/20 0.35
KMT2A Q03164 1/20 0.35
HCRTR2 O43614 1/20 0.34
STS P08842 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27585806 0.81 LMNA (0.47) ALDH1A1LMNAGAASMN1; SMN2MAPT
SCHEMBL28114919 0.77 ALDH1A1 (0.41) ALDH1A1LMNAGAASMN1; SMN2MAPT
SCHEMBL28111502 0.73 ALDH1A1 (0.42) ALDH1A1LMNAGAASMN1; SMN2MAPT
SCHEMBL11608946 0.73 POLB (0.42) ALDH1A1LMNAGAAMAPTCYP1A2
SCHEMBL8713414 0.71 MMP13 (0.43) LMNAGAASMN1; SMN2NPSR1HTT
SCHEMBL9755720 0.71 ALDH1A1 (0.56) ALDH1A1LMNAGAASMN1; SMN2MAPT
SCHEMBL14493233 0.70 TSHR (0.50) ALDH1A1LMNASMN1; SMN2MAPK1CYP3A4
SCHEMBL4905507 0.70 LMNA (0.62) ALDH1A1LMNAGAASMN1; SMN2MAPT
SCHEMBL1173934 0.69 TSHR (0.41) ALDH1A1LMNAGAASMN1; SMN2STS
SCHEMBL29176394 0.69 GAA (0.44) ALDH1A1LMNAGAASMN1; SMN2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106133606-B Additive and resist lower membrane formation composition comprising the additive 日产化学工业株式会社 2019-06-28 CN disclosed
CN-108351593-A Resist lower membrane formation composition additive and resist lower membrane formation composition comprising the additive 日产化学工业株式会社 2018-07-31 CN disclosed
CN-106133606-A Additive and comprise the resist lower membrane formation compositions of this additive 日产化学工业株式会社 2016-11-16 CN disclosed