SCHEMBL28114919

SCHEMBL28114919

C=C(C(=O)OCCC)S(=O)(=O)c1ccc(C)cc1

nearest known ligand 0.41

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.41
NPC1 O15118 1/20 0.41
MAPT P10636 1/20 0.41
RAB9A P51151 1/20 0.41
NPSR1 Q6W5P4 1/20 0.41
KMT2A Q03164 3/20 0.41
GAA P10253 3/20 0.41
LMNA P02545 5/20 0.39
SMN1; SMN2 Q16637 2/20 0.39
RECQL P46063 1/20 0.39
HSD17B10 Q99714 1/20 0.39
TSHR P16473 2/20 0.38
KDM4E B2RXH2 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
ALB P02768 1/20 0.38
CYP2C9 P11712 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
PLA2G2C Q5R387 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9755721 0.89 ALDH1A1 (0.50) ALDH1A1NPC1MAPTRAB9ANPSR1
SCHEMBL27585806 0.86 LMNA (0.47) ALDH1A1MAPTKMT2AGAALMNA
SCHEMBL8713414 0.85 MMP13 (0.43) NPSR1GAALMNASMN1; SMN2TSHR
SCHEMBL27542589 0.78 ALDH1A1 (0.46) ALDH1A1MAPTRAB9AKMT2AGAA
SCHEMBL9755727 0.77 MEN1 (0.58) ALDH1A1NPC1MAPTRAB9ANPSR1
SCHEMBL28114918 0.77 ALDH1A1 (0.41) ALDH1A1MAPTNPSR1KMT2AGAA
SCHEMBL9755720 0.76 ALDH1A1 (0.56) ALDH1A1MAPTKMT2AGAALMNA
SCHEMBL9755713 0.76 ALDH1A1 (0.46) ALDH1A1NPSR1GAALMNASMN1; SMN2
SCHEMBL14493233 0.75 TSHR (0.50) ALDH1A1NPC1RAB9ALMNASMN1; SMN2
SCHEMBL9755728 0.73 GAA (0.46) ALDH1A1MAPTKMT2AGAALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106133606-B Additive and resist lower membrane formation composition comprising the additive 日产化学工业株式会社 2019-06-28 CN disclosed
CN-108351593-A Resist lower membrane formation composition additive and resist lower membrane formation composition comprising the additive 日产化学工业株式会社 2018-07-31 CN disclosed
CN-106133606-A Additive and comprise the resist lower membrane formation compositions of this additive 日产化学工业株式会社 2016-11-16 CN disclosed