Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FBP1 | P09467 | 6/20 | 0.39 |
| ▸ | EPHX1 | P07099 | 3/20 | 0.37 |
| ▸ | MMP2 | P08253 | 1/20 | 0.36 |
| ▸ | SCN5A | Q14524 | 3/20 | 0.36 |
| ▸ | SCN9A | Q15858 | 3/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | PKM | P14618 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28300722 | 0.85 | HCRTR2 (0.34) | — | |
| SCHEMBL28227127 | 0.84 | CNR2 (0.38) | MMP2 | |
| SCHEMBL28299239 | 0.82 | MTNR1B (0.41) | — | |
| SCHEMBL23923246 | 0.82 | TDP1 (0.40) | PKM | |
| SCHEMBL23923247 | 0.82 | TDP1 (0.40) | PKM | |
| SCHEMBL9010804 | 0.82 | PGR (0.44) | FBP1MMP2 | |
| SCHEMBL2965787 | 0.79 | TDP1 (0.41) | MAPTPKM | |
| SCHEMBL36315 | 0.77 | ALDH1A1 (0.38) | MMP2MAPTPKM | |
| SCHEMBL28288620 | 0.76 | TDP1 (0.38) | — | |
| SCHEMBL13657224 | 0.76 | HDAC3 (0.39) | MMP2MAPTPKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107001550-B | Novolak phenolics, its manufacturing method, photosensitive composite, erosion resistant and film | DIC株式会社 | 2019-04-02 | — | — | CN | disclosed |
| CN-107001550-A | Novolak phenolics, its manufacture method, photosensitive composite, erosion resistant and film | DIC株式会社 | 2017-08-01 | — | — | CN | disclosed |
| CN-107003612-A | Resist lower membrane formation photosensitive composite and resist lower membrane | DIC株式会社 | 2017-08-01 | — | — | CN | disclosed |