Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PGR | P06401 | 5/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | MMP2 | P08253 | 1/20 | 0.42 |
| ▸ | FBP1 | P09467 | 7/20 | 0.42 |
| ▸ | NFE2L2 | Q16236 | 2/20 | 0.41 |
| ▸ | FLT1 | P17948 | 1/20 | 0.41 |
| ▸ | FLT4 | P35916 | 1/20 | 0.41 |
| ▸ | KDR | P35968 | 1/20 | 0.41 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3174904 | 0.84 | MEN1 (0.41) | PGRMEN1ALDH1A1KMT2AMMP2 | |
| SCHEMBL30137815 | 0.84 | MEN1 (0.41) | PGRMEN1ALDH1A1KMT2AMMP2 | |
| SCHEMBL3174918 | 0.83 | MEN1 (0.40) | MEN1ALDH1A1KMT2AMMP2FBP1 | |
| SCHEMBL30137798 | 0.83 | MEN1 (0.40) | MEN1ALDH1A1KMT2AMMP2FBP1 | |
| SCHEMBL28166172 | 0.82 | FBP1 (0.39) | MMP2FBP1 | |
| SCHEMBL9011464 | 0.79 | ATM (0.42) | PGRMMP2FLT1FLT4KDR | |
| SCHEMBL2529402 | 0.79 | KMT2A (0.46) | MEN1ALDH1A1KMT2AFBP1 | |
| SCHEMBL11973784 | 0.79 | MAPT (0.44) | MEN1ALDH1A1KMT2AMMP2FLT1 | |
| SCHEMBL9011982 | 0.78 | APEX1 (0.42) | ALDH1A1MMP2NFE2L2FLT1FLT4 | |
| SCHEMBL547494 | 0.77 | ALDH1A1 (0.48) | MEN1ALDH1A1KMT2AMMP2FLT1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0417557-B1 | Positive-working radiation-sensitive mixture and recording material prepared therefrom | HOECHST AG (DE) | 1996-12-11 | — | — | EP | disclosed |
| EP-0444493-B1 | Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom | HOECHST AG (DE) | 1996-11-20 | — | — | EP | disclosed |
| US-5424166-A | Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1995-06-13 | — | — | US | disclosed |
| US-5338641-A | Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α,α-bis(sulfonyl) diazo methane as an acid forming compound | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-08-16 | — | — | US | disclosed |
| EP-0444493-A2 | Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-09-04 | — | — | EP | disclosed |
| EP-0417557-A2 | Positive-working radiation-sensitive mixture and recording material prepared therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-03-20 | — | — | EP | disclosed |