SCHEMBL28291485

SCHEMBL28291485

CCO[SiH2]c1ccccc1CC

nearest known ligand 0.40

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.40
L3MBTL1 Q9Y468 2/20 0.40
NPSR1 Q6W5P4 1/20 0.40
GABRA1 P14867 4/20 0.37
GABRB2 P47870 4/20 0.37
MGLL Q99685 1/20 0.34
NLRP3 Q96P20 2/20 0.33
CYP4F2 P78329 1/20 0.33
CYP4A11 Q02928 1/20 0.33
KCNH2 Q12809 1/20 0.32
TSHR P16473 1/20 0.32
CLCN2 P51788 1/20 0.32
HPGD P15428 1/20 0.32
ATM Q13315 1/20 0.32
TP53 P04637 1/20 0.31
CYP2D6 P10635 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3482388 0.94 L3MBTL1 (0.37) MAPTL3MBTL1NPSR1GABRA1GABRB2
SCHEMBL27639890 0.81 L3MBTL1 (0.40) MAPTL3MBTL1NPSR1TSHRHPGD
SCHEMBL28290082 0.81 GABRA1 (0.38) MAPTL3MBTL1NPSR1GABRA1GABRB2
SCHEMBL3481543 0.80 L3MBTL1 (0.35) MAPTL3MBTL1NPSR1GABRA1GABRB2
SCHEMBL3766605 0.79 MGLL (0.38) MAPTL3MBTL1NPSR1GABRA1GABRB2
SCHEMBL703521 0.78 LTA4H (0.37) L3MBTL1NPSR1KCNH2TSHRTP53
SCHEMBL27297188 0.77 TSHR (0.38) MAPTL3MBTL1NPSR1TSHR
SCHEMBL706208 0.76 GABRA1 (0.39) MAPTL3MBTL1NPSR1GABRA1GABRB2
SCHEMBL707826 0.76 MGLL (0.36) MAPTL3MBTL1NPSR1GABRA1GABRB2
SCHEMBL28290049 0.76 GABRA1 (0.34) MAPTL3MBTL1NPSR1GABRA1GABRB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109641482-A The preparation of the cis- -1,4- polydiene of multiple silane functionals with the Si―H addition reaction in situ preparation by polymer glue 株式会社普利司通 2019-04-16 CN disclosed
CN-100535054-C Silica film forming material, silica film and preparation method thereof FUJITSU LTD (JP) 2009-09-02 CN disclosed
CN-1891757-A Silica film forming material, silica film and method of manufacturing the same FUJITSU LTD (JP) 2007-01-10 CN disclosed