Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 2/20 | 0.81 |
| ▸ | TSHR | P16473 | 7/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.50 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | APEX1 | P27695 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 2/20 | 0.32 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.32 |
| ▸ | MGAM | O43451 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | SI | P14410 | 1/20 | 0.32 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.32 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.32 |
| ▸ | GLO1 | Q04760 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL36524 | 0.90 | THRB (1.00) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL24512197 | 0.90 | THRB (0.70) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL2120122 | 0.89 | THRB (0.65) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL2120071 | 0.89 | THRB (0.65) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL16504107 | 0.88 | THRB (0.96) | THRBTSHRALDH1A1POLBAPEX1 | |
| Ether SCHEMBL22660834 | 0.88 | THRB (0.88) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL887753 | 0.88 | THRB (0.96) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL8850982 | 0.88 | THRB (0.96) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL8850621 | 0.88 | THRB (0.96) | THRBTSHRALDH1A1POLBAPEX1 | |
| SCHEMBL11754913 | 0.88 | THRB (0.96) | THRBTSHRALDH1A1POLBAPEX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10719014-B2 | Photoresists comprising amide component | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2020-07-21 | — | — | US | disclosed |
| US-9541834-B2 | Ionic thermal acid generators for low temperature applications | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-01-10 | — | — | US | disclosed |
| US-9298093-B2 | Polymers, photoresist compositions and methods of forming photolithographic patterns | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2016-03-29 | — | — | US | disclosed |
| US-20150212414-A1 | IONIC THERMAL ACID GENERATORS FOR LOW TEMPERATURE APPLICATIONS | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2015-07-30 | — | — | US | disclosed |
| US-8975001-B2 | Photoresist compositions and methods of forming photolithographic patterns | ROHM AND HAAS ELECTRONICS MATERIALS LLC (US) | 2015-03-10 | — | — | US | disclosed |
| US-8790867-B2 | Methods of forming photolithographic patterns by negative tone development | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-07-29 | — | — | US | disclosed |
| US-8771917-B2 | Monomers, polymers, photoresist compositions and methods of forming photolithographic patterns | ROHM AND HAAS ELECTRONICS MATERIALS LLC (US) | 2014-07-08 | — | — | US | disclosed |
| US-20140120469-A1 | THERMAL ACID GENERATORS FOR USE IN PHOTORESIST | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-05-01 | — | — | US | disclosed |
| US-20140120470-A1 | PHOTORESISTS COMPRISING IONIC COMPOUND | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-05-01 | — | — | US | disclosed |
| US-20130344439-A1 | PHOTORESISTS COMPRISING AMIDE COMPONENT | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2013-12-26 | — | — | US | disclosed |
| EP-2472325-A1 | Polymers, photoresist compositions and methods of forming photolithographic patterns | Rohm and Haas Electronic Materials LLC (US) | 2012-07-04 | — | — | EP | disclosed |
| EP-2472326-A1 | Polymers, photoresist compositions and methods of forming photolithographic patterns | Rohm and Haas Electronic Materials LLC (US) | 2012-07-04 | — | — | EP | disclosed |
| EP-2461213-A1 | Polymers, photoresist compositions and methods of forming photolithographic patterns | Rohm and Haas Electronic Materials LLC (US) | 2012-06-06 | — | — | EP | disclosed |
| US-20120095121-A1 | HYDROPHILIC POLYOLEFIN SINTERED BODY | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2012-04-19 | — | — | US | disclosed |
| US-20120077120-A1 | PHOTORESISTS COMPRISING MULTI-AMIDE COMPONENT | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-03-29 | — | — | US | disclosed |
| US-20120064456-A1 | PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS | DOW GLOBAL TECHNOLOGIES LLC (US) | 2012-03-15 | — | — | US | disclosed |
| EP-2428843-A1 | Photoresist compositions and methods of forming photolithographic patterns | Rohm and Haas Electronic Materials LLC (US) | 2012-03-14 | — | — | EP | disclosed |
| EP-2428842-A1 | Photoresists comprising multi-amide component | Rohm and Haas Electronic Materials LLC (US) | 2012-03-14 | — | — | EP | disclosed |
| EP-2174975-A1 | HYDROPHILIC POLYOLEFIN SINTERED BODY | Asahi Kasei Chemicals Corporation (JP) | 2010-04-14 | — | — | EP | disclosed |
| US-4631251-A | Heat-developable color photo-sensitive material with polymeric coupler | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1986-12-23 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10719014-B2 | Photoresists comprising amide component | ASPH, ALAD, SUN2 | THRB 4638/4885TSHR 4127/4885ALDH1A1 823/4885 |
| US-20150212414-A1 | IONIC THERMAL ACID GENERATORS FOR LOW TEMPERATURE APPLICATIONS | TRIM4, TRMT1, TRIM59 | THRB 3259/4885TSHR 4541/4885ALDH1A1 1833/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.