Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNH2 | Q12809 | 1/20 | 0.39 |
| ▸ | LTA4H | P09960 | 1/20 | 0.38 |
| ▸ | DPP4 | P27487 | 3/20 | 0.38 |
| ▸ | CA12 | O43570 | 1/20 | 0.37 |
| ▸ | CA9 | Q16790 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 5/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | HPGD | P15428 | 3/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | PRMT6 | Q96LA8 | 1/20 | 0.37 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.36 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.36 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | GLA | P06280 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26781842 | 0.76 | KIF11 (0.48) | KCNH2PRMT6ALOX5PTGS1PTGS2 | |
| SCHEMBL20595524 | 0.74 | KCNH2 (0.48) | KCNH2LTA4HMAPTKDM4EPRMT6 | |
| SCHEMBL9336615 | 0.74 | HSD17B1 (0.43) | MAPTMEN1KMT2ANPC1CYP3A4 | |
| SCHEMBL4627315 | 0.74 | ALDH1A1 (0.40) | KCNH2LTA4HMAPTKDM4EALDH1A1 | |
| SCHEMBL9257921 | 0.73 | KIF11 (0.55) | KCNH2LTA4HMAPTKDM4EALDH1A1 | |
| SCHEMBL1623633 | 0.72 | LTA4H (0.52) | KCNH2LTA4HMAPTKDM4EALDH1A1 | |
| SCHEMBL28463106 | 0.72 | ALOX5 (0.41) | KCNH2LTA4HDPP4CA12CA9 | |
| SCHEMBL26259704 | 0.72 | MAPT (0.39) | KCNH2LTA4HCA12CA9MAPT | |
| SCHEMBL22733865 | 0.71 | KCNH2 (0.48) | KCNH2LTA4HMAPTKDM4EALDH1A1 | |
| SCHEMBL27451260 | 0.71 | KDM4E (0.42) | KCNH2LTA4HDPP4MAPTKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115087928-A | Resist pattern forming method | 东京应化工业株式会社 | 2022-09-20 | — | — | CN | disclosed |
| CN-114967342-A | Positive photosensitive composition and dry film, patterned resist film, substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2022-08-30 | — | — | CN | disclosed |
| CN-114902134-A | Chemically amplified photosensitive composition, photosensitive dry film and method for producing same, method for producing resist film, and acid diffusion inhibitor | 东京应化工业株式会社 | 2022-08-12 | — | — | CN | disclosed |
| CN-114868081-A | Photosensitive resin composition, dry film and method for producing same, resist film, substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2022-08-05 | — | — | CN | disclosed |
| CN-114690560-A | Photosensitive resin composition, dry film, patterned resist film, substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2022-07-01 | — | — | CN | disclosed |
| CN-114207524-A | Resin composition, dry film, resist film, compound, acid generator, and method for producing N-organic sulfonyloxy compound | 东京应化工业株式会社 | 2022-03-18 | — | — | CN | disclosed |
| CN-113260921-A | Photosensitive resin composition, dry film, photosensitive dry film, resist film, substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2021-08-13 | — | — | CN | disclosed |
| CN-111919174-A | Method for producing plated molded article | 东京应化工业株式会社 | 2020-11-10 | — | — | CN | disclosed |
| CN-111381444-A | Photosensitive resin composition, photosensitive dry film, patterned resist film, substrate with mold, and method for producing plated article | 东京应化工业株式会社 | 2020-07-07 | — | — | CN | disclosed |
| CN-110647010-A | Resin composition, dry film and dry film, resist film, substrate, method for producing plated article, and nitrogen-containing aromatic heterocyclic compound | 东京应化工业株式会社 | 2020-01-03 | — | — | CN | disclosed |