SCHEMBL283713

SCHEMBL283713

CCCCN(CCCC)C(=O)CC(=O)N(CCCC)CCCC

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 3/20 0.56
CA1 P00915 3/20 0.56
CA9 Q16790 3/20 0.56
MMP1 P03956 1/20 0.52
MMP2 P08253 1/20 0.52
MMP3 P08254 1/20 0.52
MMP8 P22894 1/20 0.52
SIGMAR1 Q99720 2/20 0.46
ALDH1A1 P00352 3/20 0.44
ALDH2 P05091 1/20 0.44
HPGD P15428 1/20 0.41
CA2 P00918 1/20 0.41
KDM5A P29375 6/20 0.41
KDM4C Q9H3R0 5/20 0.41
HDAC3 O15379 1/20 0.41
HDAC1 Q13547 1/20 0.41
HDAC2 Q92769 1/20 0.41
HDAC6 Q9UBN7 1/20 0.41
NCOR2 Q9Y618 1/20 0.41
PHF8 Q9UPP1 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3625206 0.92 CA12 (0.48) CA12CA1CA9MMP1MMP2
SCHEMBL10339549 0.91 ALDH1A1 (0.52) CA12CA1CA9MMP1MMP2
SCHEMBL23748010 0.90 CA12 (0.50) CA12CA1CA9MMP1MMP2
SCHEMBL944778 0.90 CA12 (0.50) CA12CA1CA9MMP1MMP2
SCHEMBL2417403 0.88 CA12 (0.50) CA12CA1CA9MMP1MMP2
SCHEMBL1129612 0.88 CA12 (0.50) CA12CA1CA9MMP1MMP2
SCHEMBL15016405 0.86 CA12 (0.48) CA12CA1CA9MMP1MMP2
SCHEMBL30364182 0.86 CA12 (0.48) CA12CA1CA9MMP1MMP2
SCHEMBL30364158 0.86 CA12 (0.48) CA12CA1CA9MMP1MMP2
SCHEMBL12323564 0.86 CA12 (0.48) CA12CA1CA9MMP1MMP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 167 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240231227-A1 OXATHIANIUM ION-CONTAINING SULFONIC ACID DERIVATIVE COMPOUND AS PHOTOACID GENERATORS IN RESIST APPLICATIONS HERAEUS EPURIO LLC 2024-07-11 US claimed
WO-2022272226-A1 OXATHIANIUM ION-CONTAINING SULFONIC ACID DERIVATIVE COMPOUND AS PHOTOACID GENERATORS IN RESIST APPLICATIONS HERAEUS EPURIO LLC (US) 2022-12-29 WO claimed
US-9709886-B2 Sulfonic acid derivative compounds as photoacid generators in resist applications Heraeus Precious Metals North America Daychem LLC (US) 2017-07-18 US claimed
US-20170003587-A1 SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS HERAEUS EPURIO LLC 2017-01-05 US claimed
US-20120077120-A1 PHOTORESISTS COMPRISING MULTI-AMIDE COMPONENT ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2012-03-29 US claimed
EP-2428842-A1 Photoresists comprising multi-amide component Rohm and Haas Electronic Materials LLC (US) 2012-03-14 EP claimed
US-20260132241-A1 MAIN CHAIN SCISSIONABLE BLOCK COPOLYMERS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) 2026-05-14 US disclosed
US-20260093176-A1 ELECTROACTIVE COMPOUNDS, COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) 2026-04-02 US disclosed
US-20260079399-A1 POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) 2026-03-19 US disclosed
US-12493241-B2 Photoacid generators, photoresist compositions, and pattern formation methods DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) 2025-12-09 US disclosed
US-20250216782-A1 MASKING PROCESS USING SWITCHABLE POLYMER TOKYO ELECTRON LTD (JP) 2025-07-03 US disclosed
US-20250216763-A1 ANTI-SPACER MASKING PROCESS USING RESIST LAYER WITH SOLUBILITY SHIFTING AGENT TOKYO ELECTRON LTD (JP) 2025-07-03 US disclosed
US-20250216783-A1 ANTI-SPACER MASKING PROCESS USING SECOND SWITCHABLE POLYMER TOKYO ELECTRON LTD (JP) 2025-07-03 US disclosed
US-4938871-A Alkylation COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) 1990-07-03 US disclosed
EP-0210928-B1 EXTRACTING AGENTS AND PROPANE DIAMIDES, THEIR USE TO RECOVER ACTINIDES AND/OR LANTHANIDES AND PROCESS FOR THEIR PREPARATION COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) 1990-03-14 EP disclosed
US-4770807-A RECOVERY OF ACTINIDES AND-OR LANTHANIDES COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) 1988-09-13 US disclosed
EP-0110789-B1 PROCESS FOR RECOVERING ACTINIDES AND/OR LANTHANIDES PRESENT IN THEIR TRIVALENT STATE IN AN AQUEOUS ACIDIC SOLUTION COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) 1987-02-11 EP disclosed
EP-0210928-A1 Extracting agents and propane diamides, their use to recover actinides and/or lanthanides and process for their preparation COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) 1987-02-04 EP disclosed
US-4572802-A EXTRACTION WITH DIAMIDES COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) 1986-02-25 US disclosed
EP-0110789-A1 Process for recovering actinides and/or lanthanides present in their trivalent state in an aqueous acidic solution COMMISSARIAT A L'ENERGIE ATOMIQUE (FR) 1984-06-13 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12493241-B2 Photoacid generators, photoresist compositions, and pattern formation methods ARF1, ARL1, GNA11 CA12 2881/4885CA1 692/4885CA9 1992/4885
US-20260132241-A1 MAIN CHAIN SCISSIONABLE BLOCK COPOLYMERS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS DCLRE1A, CD79B, RAD1 CA12 259/4885CA1 340/4885CA9 974/4885
US-20260093176-A1 ELECTROACTIVE COMPOUNDS, COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS ETV6, KCNQ4, KCNQ1 CA12 3036/4885CA1 3014/4885CA9 1431/4885
US-20170003587-A1 SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS ALAD, MPST, ASIC1 CA12 1719/4885CA1 417/4885CA9 265/4885
US-20260079399-A1 POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS GAR1, RPA1, ARL1 CA12 3216/4885CA1 2942/4885CA9 3966/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.