Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.42 |
| ▸ | HPGD | P15428 | 2/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | PTPN11 | Q06124 | 2/20 | 0.40 |
| ▸ | CRHBP | P24387 | 1/20 | 0.39 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.39 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.39 |
| ▸ | PTPN6 | P29350 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 2/20 | 0.38 |
| ▸ | NSD2 | O96028 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL284471 | 1.00 | ALDH1A1 (0.42) | ALDH1A1TDP1HPGDSMN1; SMN2TSHR | |
| SCHEMBL283959 | 0.86 | MEN1 (0.47) | ALDH1A1TDP1HPGDSMN1; SMN2TSHR | |
| SCHEMBL215722 | 0.86 | MEN1 (0.47) | ALDH1A1TDP1HPGDSMN1; SMN2TSHR | |
| SCHEMBL8665553 | 0.80 | ALDH1A1 (0.44) | ALDH1A1TDP1HPGDSMN1; SMN2TSHR | |
| SCHEMBL8665555 | 0.80 | ALDH1A1 (0.44) | ALDH1A1TDP1HPGDSMN1; SMN2TSHR | |
| SCHEMBL4053019 | 0.80 | TSHR (0.45) | ALDH1A1TDP1SMN1; SMN2TSHRCRHBP | |
| SCHEMBL283802 | 0.79 | CYP1A2 (0.48) | ALDH1A1TDP1HPGDSMN1; SMN2TSHR | |
| SCHEMBL283799 | 0.79 | CYP1A2 (0.48) | ALDH1A1TDP1HPGDSMN1; SMN2TSHR | |
| SCHEMBL284469 | 0.77 | TSHR (0.41) | ALDH1A1TDP1SMN1; SMN2TSHRMCOLN3 | |
| SCHEMBL1476156 | 0.77 | TSHR (0.41) | ALDH1A1TDP1SMN1; SMN2TSHRMCOLN3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 315 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240294771-A1 | ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER | Tan Kah Kee Innovation Laboratory (CN) | 2024-09-05 | — | — | US | claimed |
| CN-118244576-A | Photosensitive resin composition and cured film thereof | 罗门哈斯电子材料韩国有限公司 | 2024-06-25 | — | — | CN | claimed |
| WO-2023070957-A1 | ANTI-REFLECTIVE COATING COMPOSITION AND CROSSLINKABLE POLYMER | 嘉庚创新实验室 | 2023-05-04 | — | — | WO | claimed |
| CN-113913075-B | Anti-reflective coating composition and crosslinkable polymer | 嘉庚创新实验室 | 2022-09-20 | — | — | CN | claimed |
| EP-2326744-B1 | METAL COMPOSITIONS AND METHODS OF MAKING SAME | PRYOG LLC (US) | 2022-06-01 | — | — | EP | claimed |
| CN-113913075-A | Anti-reflective coating composition and crosslinkable polymer | 嘉庚创新实验室 | 2022-01-11 | — | — | CN | claimed |
| EP-0679951-B1 | Positive resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 1997-01-15 | — | — | EP | claimed |
| EP-0679951-A1 | Positive resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-11-02 | — | — | EP | claimed |
| US-20260140448-A1 | UNDERLAYER COMPOSITION FOR USE IN MANUFACTURING ELECTRONIC DEVICES | DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) | 2026-05-21 | — | — | US | disclosed |
| US-20260132241-A1 | MAIN CHAIN SCISSIONABLE BLOCK COPOLYMERS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) | 2026-05-14 | — | — | US | disclosed |
| US-20260118761-A1 | COMPOUND FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, POLYMER, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | Tan Kah Kee Innovation Laboratory (CN) | 2026-04-30 | — | — | US | disclosed |
| US-20260118762-A1 | POLYMER FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | Tan Kah Kee Innovation Laboratory (CN) | 2026-04-30 | — | — | US | disclosed |
| US-20260093176-A1 | ELECTROACTIVE COMPOUNDS, COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) | 2026-04-02 | — | — | US | disclosed |
| US-20260079399-A1 | POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS | DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) | 2026-03-19 | — | — | US | disclosed |
| US-5955240-A | MODIFIED POLYHYDROXYSTYRENE, ACID GENERATING CHEMICAL, CARBOXYLIC ACID, AMINE | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-09-21 | — | — | US | disclosed |
| US-5854357-A | Process for the production of polyhydroxstyrene | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-12-29 | — | — | US | disclosed |
| US-5736296-A | Positive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-04-07 | — | — | US | disclosed |
| EP-0762207-A2 | Positive working photosensitive composition and method of producing relief structures | BASF AKTIENGESELLSCHAFT (DE) | 1997-03-12 | — | — | EP | disclosed |
| EP-0679951-B1 | Positive resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 1997-01-15 | — | — | EP | disclosed |
| EP-0679951-A1 | Positive resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-11-02 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260132241-A1 | MAIN CHAIN SCISSIONABLE BLOCK COPOLYMERS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | DCLRE1A, CD79B, RAD1 | ALDH1A1 2959/4885TDP1 2535/4885HPGD 2963/4885 |
| US-20260093176-A1 | ELECTROACTIVE COMPOUNDS, COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | ETV6, KCNQ4, KCNQ1 | ALDH1A1 3046/4885TDP1 1839/4885HPGD 3786/4885 |
| US-20260079399-A1 | POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS | GAR1, RPA1, ARL1 | ALDH1A1 237/4885TDP1 2181/4885HPGD 3468/4885 |
| US-20260118761-A1 | COMPOUND FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, POLYMER, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | RAD51, COL2A1, MRPL11 | ALDH1A1 4156/4885TDP1 4095/4885HPGD 3855/4885 |
| US-20260118762-A1 | POLYMER FOR PHOTOLITHOGRAPHIC MEDIUM COMPOSITION, AND PHOTOLITHOGRAPHIC MEDIUM COMPOSITION | SEC23B, SEC23IP, SEC16A | ALDH1A1 4640/4885TDP1 2317/4885HPGD 1732/4885 |
| US-20260140448-A1 | UNDERLAYER COMPOSITION FOR USE IN MANUFACTURING ELECTRONIC DEVICES | ARCN1, ASH2L, ITGB4 | ALDH1A1 2211/4885TDP1 3286/4885HPGD 3577/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.