SCHEMBL28496629

SCHEMBL28496629

CN(Cc1ccccc1)C(=O)Cc1[c]cccc1

nearest known ligand 0.66

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 3/20 0.58
RAB9A P51151 3/20 0.58
KMT2A Q03164 4/20 0.54
SMN1; SMN2 Q16637 2/20 0.50
CA12 O43570 1/20 0.50
CA9 Q16790 1/20 0.50
ALDH1A1 P00352 1/20 0.48
POLB P06746 1/20 0.48
TSPO P30536 1/20 0.47
MAPK1 P28482 1/20 0.46
MEN1 O00255 2/20 0.45
HPGD P15428 2/20 0.44
RIPK1 Q13546 1/20 0.44
AOC3 Q16853 1/20 0.43
ROCK2 O75116 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27524135 0.85 LTB4R (0.53) KMT2A
SCHEMBL3769274 0.80 NR4A2 (0.38) NPC1RAB9ASMN1; SMN2HPGD
SCHEMBL1516137 0.80 NPC1 (0.75) NPC1RAB9AKMT2ASMN1; SMN2CA12
SCHEMBL3759361 0.77 ACHE (0.40) SMN1; SMN2ALDH1A1MAPK1
SCHEMBL4421574 0.74 NPC1 (0.66) NPC1RAB9AKMT2ASMN1; SMN2CA12
SCHEMBL28098701 0.74 TSPO (0.41) NPC1RAB9AALDH1A1TSPOHPGD
SCHEMBL3163935 0.73 NPC1 (0.75) NPC1RAB9AKMT2ASMN1; SMN2CA12
SCHEMBL544272 0.73 NPC1 (0.75) NPC1RAB9AKMT2ASMN1; SMN2CA12
SCHEMBL29993175 0.73 NPC1 (0.75) NPC1RAB9AKMT2ASMN1; SMN2CA12
SCHEMBL544271 0.73 NPC1 (0.75) NPC1RAB9AKMT2ASMN1; SMN2CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112209847-B Method for preparing amide compound under catalysis of ionic liquid in high-pressure environment 烟台大学 2022-12-23 CN disclosed
CN-112209847-A Method for preparing amide compound under catalysis of ionic liquid in high-pressure environment 烟台大学 2021-01-12 CN disclosed