Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.33 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.33 |
| ▸ | PTPN5 | P54829 | 1/20 | 0.33 |
| ▸ | PTPN11 | Q06124 | 1/20 | 0.33 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | MYC | P01106 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | FABP3 | P05413 | 1/20 | 0.31 |
| ▸ | FABP4 | P15090 | 1/20 | 0.31 |
| ▸ | FABP5 | Q01469 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11152385 | 0.80 | HSPA5 (0.37) | HSD17B10LMNAHPGDHIF1AKDM4E | |
| SCHEMBL9822579 | 0.79 | LMNA (0.36) | HSD17B10LMNAHPGDHIF1AKDM4E | |
| SCHEMBL5117211 | 0.77 | LCK (0.39) | HSD17B10LMNAHPGDHIF1AKDM4E | |
| SCHEMBL2057820 | 0.76 | ALOX15 (0.32) | ALOX15FABP3FABP4FABP5 | |
| SCHEMBL2866577 | 0.76 | FABP3 (0.42) | HSD17B10LMNAHPGDHIF1AALOX15 | |
| SCHEMBL168554 | 0.74 | GRIN2D (0.36) | POLBALOX15SMN1; SMN2 | |
| SCHEMBL2865462 | 0.72 | FABP3 (0.37) | HSD17B10LMNAHPGDHIF1AKDM4E | |
| SCHEMBL8954867 | 0.72 | FABP3 (0.31) | FABP3FABP4FABP5 | |
| Ammonia Solution, Strong SCHEMBL27455415 | 0.71 | GRIN2D (0.35) | HPGDKDM4EALDH1A1POLBALOX15 | |
| SCHEMBL5178615 | 0.71 | GRIN2D (0.35) | POLBALOX15SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9406834-B2 | Material for forming passivation film for semiconductor substrate, passivation film for semiconductor substrate and method of producing the same, and photovoltaic cell element and method of producing the same | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2016-08-02 | — | — | US | disclosed |
| US-20140242741-A1 | MATERIAL FOR FORMING PASSIVATION FILM FOR SEMICONDUCTOR SUBSTRATE, PASSIVATION FILM FOR SEMICONDUCTOR SUBSTRATE AND METHOD OF PRODUCING THE SAME, AND PHOTOVOLTAIC CELL ELEMENT AND METHOD OF PRODUCING THE SAME | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-08-28 | — | — | US | disclosed |
| US-8748877-B2 | Material for forming passivation film for semiconductor substrate, passivation film for semiconductor substrate and method of producing the same, and photovoltaic cell element and method of producing the same | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-06-10 | — | — | US | disclosed |
| CN-103503121-A | Material for forming passivation film for semiconductor substrate, passivation film for semiconductor substrate and method for manufacturing same, and solar cell element and method for manufacturing same | HITACHI CHEMICAL CO LTD | 2014-01-08 | — | — | CN | disclosed |
| US-20120313199-A1 | MATERIAL FOR FORMING PASSIVATION FILM FOR SEMICONDUCTOR SUBSTRATE, PASSIVATION FILM FOR SEMICONDUCTOR SUBSTRATE AND METHOD OF PRODUCING THE SAME, AND PHOTOVOLTAIC CELL ELEMENT AND METHOD OF PRODUCING THE SAME | HITACHI CHEMICAL COMPANY, LTD. | 2012-12-13 | — | — | US | disclosed |
| US-7795267-B2 | Bicyclic piperazine compound having TGR23 antagonistic activity | TAKEDA PHARMACEUTICAL COMPANY LIMITED (JP) | 2010-09-14 | — | — | US | disclosed |
| US-7754844-B2 | Polyarylene ether compound containing sulfonic acid group, composition containing same, and method for manufacturing those | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 2010-07-13 | — | — | US | disclosed |
| EP-1561768-B1 | POLYARYLENE ETHER COMPOUND CONTAINING SULFONIC ACID GROUP, COMPOSITION CONTAINING SAME, AND METHOD FOR MANUFACTURING THOSE | TOYO BOSEKI (JP) | 2009-09-30 | — | — | EP | disclosed |
| WO-2009003093-A1 | METAL PHOSPHATE COMPOUNDS AND BATTERIES CONTAINING THE SAME | TIAX, LLC (US) | 2008-12-31 | — | — | WO | disclosed |
| US-20080070086-A1 | Phase-Separated Polymer Electrolyte Membrane, Electrode - Phase-Separated Polymer Electrolyte Membrane Joint Using Same, Method for Manufacture Thereof, and Fuel Cell Using Same | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2008-03-20 | — | — | US | disclosed |
| EP-1845573-A1 | PHASE SEPARATION TYPE POLYMER ELECTROLYTE FILM, ELECTRODE/PHASE SEPARATION TYPE POLYMER ELECTROLYTE FILM ASSEMBLY EMPLOYING THE SAME, PROCESSES FOR PRODUCING THE SAME, AND FUEL CELL EMPLOYING THE SAME | Hitachi Chemical Co., Ltd. (JP) | 2007-10-17 | — | — | EP | disclosed |
| US-20070072865-A1 | Bicyclic piperazine compound and use thereof | TAKEDA PHARMACEUTICAL COMPANY LIMITED (JP) | 2007-03-29 | — | — | US | disclosed |
| CN-1292015-C | Polyarylene ether compound containing sulfonic acid group, composition containing same, and method for manufacturing those | TOYO BOSEKI (JP) | 2006-12-27 | — | — | CN | disclosed |
| US-20060166048-A1 | Polyarylene ether compound containing sulfonic acid group, composition containing same, and method for manufacturing those | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 2006-07-27 | — | — | US | disclosed |
| EP-1661898-A1 | BICYCLIC PIPERAZINE COMPOUND AND USE THEREOF | Takeda Pharmaceutical Company Limited (JP) | 2006-05-31 | — | — | EP | disclosed |
| CN-1703443-A | Polyarylene ether compound containing sulfonic acid group, composition containing the same, and method for producing the same | TOYO BOSEKI (JP) | 2005-11-30 | — | — | CN | disclosed |
| EP-1561768-A1 | POLYARYLENE ETHER COMPOUND CONTAINING SULFONIC ACID GROUP, COMPOSITION CONTAINING SAME, AND METHOD FOR MANUFACTURING THOSE | Toyo Boseki Kabushiki Kaisha (JP) | 2005-08-10 | — | — | EP | disclosed |
| US-5596128-A | SULFONATION WITHOUT A CATALYST IN THE PRESENCE OF SOLVENT | KONISHI CHEMICAL IND. CO., LTD. (JP) | 1997-01-21 | — | — | US | disclosed |
| EP-0505582-B1 | SULFONATING AGENT AND PROCESS | KONISHI CHEM IND (JP) | 1996-07-31 | — | — | EP | disclosed |
| EP-0505582-A1 | SULFONATING AGENT AND PROCESS | KONISHI CHEMICAL IND. CO., LTD. (JP) | 1992-09-30 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070072865-A1 | Bicyclic piperazine compound and use thereof | GPR3, FFAR3, LPAR3 | HSD17B10 514/4885LMNA 4583/4885HPGD 1412/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.