Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | APP | P05067 | 1/20 | 0.33 |
| ▸ | BACE1 | P56817 | 1/20 | 0.33 |
| ▸ | MGMT | P16455 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
| ▸ | MMP1 | P03956 | 1/20 | 0.30 |
| ▸ | MMP2 | P08253 | 1/20 | 0.30 |
| ▸ | MMP9 | P14780 | 1/20 | 0.30 |
| ▸ | MMP12 | P39900 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8471918 | 0.89 | MGMT (0.37) | APPBACE1MGMTALDH1A1MAPK1 | |
| SCHEMBL141870 | 0.80 | LTA4H (0.50) | APPBACE1MGMT | |
| SCHEMBL9479303 | 0.79 | GAA (0.47) | ALDH1A1MAPK1HTTL3MBTL1 | |
| SCHEMBL8124374 | 0.79 | MAOA (0.43) | APPBACE1ALDH1A1HTTL3MBTL1 | |
| SCHEMBL8130697 | 0.79 | MAPT (0.43) | APPBACE1MGMTALDH1A1L3MBTL1 | |
| SCHEMBL8125571 | 0.79 | IDO1 (0.44) | APPBACE1ALDH1A1MAPK1L3MBTL1 | |
| SCHEMBL251357 | 0.77 | MGMT (0.40) | MGMTALDH1A1L3MBTL1MMP1MMP2 | |
| SCHEMBL7565860 | 0.75 | MGMT (0.33) | APPBACE1MGMTMMP1MMP2 | |
| SCHEMBL3965732 | 0.75 | ALDH1A1 (0.49) | ALDH1A1MAPK1L3MBTL1 | |
| SCHEMBL6159361 | 0.75 | TTR (0.36) | APPBACE1MGMTALDH1A1MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024085293-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | 영창케미칼 주식회사 | 2024-04-25 | — | — | WO | claimed |
| WO-2001070853-A2 | METHOD OF PREPARING A POLYMERIZATE | PPG INDUSTRIES OHIO, INC. (US) | 2001-09-27 | — | — | WO | claimed |
| WO-2024085293-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | 영창케미칼 주식회사 | 2024-04-25 | — | — | WO | disclosed |
| EP-4348352-A1 | METHOD FOR USING COMPOSITION COMPRISING ORGANIC ACID COMPOUND, LITHOGRAPHY COMPOSITION COMPRISING ORGANIC ACID COMPOUND, AND METHOD FOR MANUFACTURING RESIST PATTERN | Merck Patent GmbH (DE) | 2024-04-10 | — | — | EP | disclosed |
| CN-107615168-B | Radiation-sensitive composition | 日产化学工业株式会社 | 2023-12-19 | — | — | CN | disclosed |
| CN-117008420-A | Radiation-sensitive composition | 日产化学工业株式会社 | 2023-11-07 | — | — | CN | disclosed |
| US-20230314937-A1 | METHOD FOR USING COMPOSITION COMPRISING CARBOXYLIC ACID ESTER, LITHOGRAPHY COMPOSITION COMPRISING CARBOXYLIC ACID ESTER, AND METHOD FOR MANUFACTURING RESIST PATTERN | MERCK PATENT GMBH (DE) | 2023-10-05 | — | — | US | disclosed |
| EP-4189486-A1 | METHOD FOR USING COMPOSITION COMPRISING CARBOXYLIC ACID ESTER, LITHOGRAPHY COMPOSITION COMPRISING CARBOXYLIC ACID ESTER, AND METHOD FOR MANUFACTURING RESIST PATTERN | Merck Patent GmbH (DE) | 2023-06-07 | — | — | EP | disclosed |
| CN-109804311-B | Chemically amplified positive photoresist composition and pattern forming method using the same | 默克专利有限公司 | 2023-06-06 | — | — | CN | disclosed |
| CN-115885217-A | Negative resist film laminate and pattern forming method | 信越化学工业株式会社 | 2023-03-31 | — | — | CN | disclosed |
| CN-108107676-B | Chemically amplified positive resist film laminate and pattern formation method | 信越化学工业株式会社 | 2023-02-21 | — | — | CN | disclosed |
| CN-103176353-A | Chemically amplified negative resist composition and patterning process | SHINETSU CHEMICAL CO | 2013-06-26 | — | — | CN | disclosed |
| EP-2533101-A2 | Sulfonium salt, polymer, chemically amplified resist composition using said polymer, and resist patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-12-12 | — | — | EP | disclosed |
| US-20120308932-A1 | POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS USING SAID CHEMICALLY AMPLIFIED RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-12-06 | — | — | US | disclosed |
| US-20120308920-A1 | SULFONIUM SALT, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION USING SAID POLYMER, AND RESIST PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-12-06 | — | — | US | disclosed |
| US-20120214100-A1 | RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-23 | — | — | US | disclosed |
| CN-101982808-A | Chemically amplified resist compositon and pattern forming process | SHINETSU CHEMICAL CO | 2011-03-02 | — | — | CN | disclosed |
| EP-2146247-A1 | Resist patterning process and manufacturing photo mask | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-01-20 | — | — | EP | disclosed |
| CN-101387831-A | Chemically amplified negative resist composition and pattern forming method | SHINETSU CHEMICAL CO (JP) | 2009-03-18 | — | — | CN | disclosed |
| EP-1693707-A1 | Positive resist composition, and patterning process using the same | Shinetsu Chemical Co., Ltd. (JP) | 2006-08-23 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120308920-A1 | SULFONIUM SALT, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION USING SAID POLYMER, AND RESIST PATTERNING PROCESS | SMCHD1, CD44, SMC1A | APP 2653/4885BACE1 4623/4885MGMT 3220/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.