SCHEMBL28902201

SCHEMBL28902201

Oc1ccc(S)c(-c2ccc(O)c(O)c2)c1

nearest known ligand 0.54

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 3/20 0.54
APP P05067 3/20 0.52
MIF P14174 1/20 0.44
XDH P47989 1/20 0.44
ESR1 P03372 2/20 0.42
ESR2 Q92731 2/20 0.42
SNCA P37840 2/20 0.42
MAPT P10636 2/20 0.42
CD38 P28907 1/20 0.41
HSD17B1 P14061 1/20 0.41
HSD17B2 P37059 1/20 0.41
QDPR P09417 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25421370 0.83 ALOX5 (0.62) ALOX5APPMIFXDHESR1
SCHEMBL7738889 0.79 ALOX5 (0.62) ALOX5APPMIFXDHESR1
SCHEMBL27640980 0.76 RAB9A (0.45) ALOX5APPMIFESR1ESR2
SCHEMBL29674576 0.75 ALOX5 (0.59) ALOX5MIFESR1ESR2MAPT
SCHEMBL2861901 0.75 ALOX5 (0.59) ALOX5MIFESR1ESR2MAPT
SCHEMBL28485078 0.74 ALOX5 (0.52) ALOX5APPMIFXDHESR1
SCHEMBL28487296 0.72 TTR (0.44) ALOX5ESR1ESR2MAPT
SCHEMBL28978920 0.72 ACHE (0.50) ALOX5ESR1ESR2HSD17B1HSD17B2
SCHEMBL13861252 0.71 PELI1 (0.53) ALOX5APPESR1ESR2MAPT
SCHEMBL1235644 0.71 ALOX5 (1.00) ALOX5APPESR1ESR2SNCA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111978228-B Monomolecular resin acid generator based on sulfonium salt and photoresist composition thereof 中国科学院理化技术研究所 2021-10-12 CN disclosed
CN-111978224-A Sulfur-containing monomolecular resin and photoresist composition thereof 中国科学院理化技术研究所 2020-11-24 CN disclosed
CN-111978228-A Monomolecular resin acid generator based on sulfonium salt and photoresist composition thereof 中国科学院理化技术研究所 2020-11-24 CN disclosed