SCHEMBL2928008

SCHEMBL2928008

C=Cc1ccccc1C(C)C(=O)O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGS2 P35354 9/20 0.43
CXCL8 P10145 2/20 0.43
MMP2 P08253 2/20 0.43
MMP9 P14780 2/20 0.43
MMP8 P22894 2/20 0.43
MMP12 P39900 2/20 0.43
MMP13 P45452 2/20 0.43
MMP14 P50281 2/20 0.43
MMP16 P51512 2/20 0.43
MMP1 P03956 1/20 0.43
PTGS1 P23219 5/20 0.42
LMNA P02545 3/20 0.38
MAPT P10636 2/20 0.38
CXCR1 P25024 2/20 0.38
CXCR2 P25025 2/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
ALDH1A1 P00352 2/20 0.38
MAPK1 P28482 2/20 0.38
RECQL P46063 1/20 0.38
KDM4E B2RXH2 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5843818 0.83 LMNA (0.44) PTGS2CXCL8MMP2MMP9MMP8
SCHEMBL11376459 0.81 LMNA (0.48) LMNAALDH1A1MAPK1HPGDCYP2C19
SCHEMBL5762624 0.80 MMP2 (0.38) PTGS2CXCL8MMP2MMP9MMP8
SCHEMBL2204495 0.80 PTGS2 (0.56) PTGS2CXCL8MMP2MMP9MMP8
SCHEMBL8099514 0.79 CA1 (0.53) PTGS2CXCL8MMP2MMP9MMP8
SCHEMBL10591005 0.79 TRPA1 (0.47) PTGS2CXCL8MMP2MMP9MMP8
SCHEMBL8099512 0.79 CA1 (0.53) PTGS2CXCL8MMP2MMP9MMP8
SCHEMBL640982 0.78 ALDH1A1 (0.43) PTGS1LMNAMAPTALDH1A1KDM4E
SCHEMBL2802851 0.78 CYP1A2 (0.37) LMNAALDH1A1MAPK1HPGDCYP2C19
SCHEMBL29407902 0.78 MEN1 (0.39) PTGS1LMNAALDH1A1MAPK1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6770780-B1 QUATERNIZATION OF T-BUTYL BROMOACETATE WITH TRI(N-BUTYL)PHOSPHINE TO FORM PHOSPHONIUM SALT; REACTING WITH BASE TO FORM PHOSPHORUS YLIDE; FORMING 2,4,6-TRIS(3', 5'-DI-T-BUTYL-4'-HYDROXYBENZYL)METHYL-STYRENE; HYDROLYSIS JSR CORPORATION (JP) 2004-08-03 US claimed
EP-1231205-A1 VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS JSR Corporation (JP) 2002-08-14 EP claimed
US-4990580-A Process for production of styrene polymers IDEMITSU KOSAN COMPANY LIMITED (JP) 1991-02-05 US claimed
CN-105585677-B Method for producing electrophoretic particle, electrophoretic dispersion liquid, electrophoretic sheet, electrophoretic device, and electronic apparatus 伊英克公司 2022-03-11 CN disclosed
US-10969647-B2 Electrophoretic particle, method of manufacturing electrophoretic particle, electrophoresis dispersion liquid, electrophoresis sheet, electrophoresis device, and electronic apparatus E INK CORPORATION (US) 2021-04-06 US disclosed
CN-105974708-B Electrophoretic particle, method for producing electrophoretic particle, electrophoretic dispersion liquid, electrophoretic sheet, electrophoretic device, and electronic apparatus 伊英克公司 2021-03-23 CN disclosed
CN-105974708-A Electrophoretic particle, method of manufacturing electrophoretic particle, electrophoresis dispersion liquid, electrophoresis sheet, electrophoresis device, and electronic apparatus 精工爱普生株式会社 2016-09-28 CN disclosed
US-20160266462-A1 ELECTROPHORETIC PARTICLE, METHOD OF MANUFACTURING ELECTROPHORETIC PARTICLE, ELECTROPHORESIS DISPERSION LIQUID, ELECTROPHORESIS SHEET, ELECTROPHORESIS DEVICE, AND ELECTRONIC APPARATUS E INK CORPORATION 2016-09-15 US disclosed
CN-105585677-A Method of manufacturing electrophoretic particle, electrophoretic particle, electrophoretic dispersion, electrophoretic sheet, electrophoretic device, and electronic apparatus SEIKO EPSON CORP 2016-05-18 CN disclosed
CN-105093773-A Method for preparing electrophoretic particles, electrophoretic particles, electrophoretic dispersion, electrophoretic sheet, electrophoretic apparatus, and electronic device SEIKO EPSON CORP 2015-11-25 CN disclosed
US-20150323850-A1 METHOD FOR PREPARING ELECTROPHORETIC PARTICLES, ELECTROPHORETIC PARTICLES, ELECTROPHORETIC DISPERSION, ELECTROPHORETIC SHEET, ELECTROPHORETIC APPARATUS, AND ELECTRONIC DEVICE SEIKO EPSON CORPORATION (JP) 2015-11-12 US disclosed
US-20050267252-A1 Electrophoretic particles and production process thereof CANON KABUSHIKI KAISHA (JP) 2005-12-01 US disclosed
US-6770780-B1 QUATERNIZATION OF T-BUTYL BROMOACETATE WITH TRI(N-BUTYL)PHOSPHINE TO FORM PHOSPHONIUM SALT; REACTING WITH BASE TO FORM PHOSPHORUS YLIDE; FORMING 2,4,6-TRIS(3', 5'-DI-T-BUTYL-4'-HYDROXYBENZYL)METHYL-STYRENE; HYDROLYSIS JSR CORPORATION (JP) 2004-08-03 US disclosed
US-6770780-B1 QUATERNIZATION OF T-BUTYL BROMOACETATE WITH TRI(N-BUTYL)PHOSPHINE TO FORM PHOSPHONIUM SALT; REACTING WITH BASE TO FORM PHOSPHORUS YLIDE; FORMING 2,4,6-TRIS(3', 5'-DI-T-BUTYL-4'-HYDROXYBENZYL)METHYL-STYRENE; HYDROLYSIS JSR CORPORATION (JP) 2004-08-03 US disclosed
US-6770780-B1 QUATERNIZATION OF T-BUTYL BROMOACETATE WITH TRI(N-BUTYL)PHOSPHINE TO FORM PHOSPHONIUM SALT; REACTING WITH BASE TO FORM PHOSPHORUS YLIDE; FORMING 2,4,6-TRIS(3', 5'-DI-T-BUTYL-4'-HYDROXYBENZYL)METHYL-STYRENE; HYDROLYSIS JSR CORPORATION (JP) 2004-08-03 US disclosed
EP-1231205-A4 VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS JSR CORP (JP) 2004-05-26 EP disclosed
EP-1231205-A1 VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS JSR Corporation (JP) 2002-08-14 EP disclosed
EP-1231205-A1 VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS JSR Corporation (JP) 2002-08-14 EP disclosed
JP-2001316333-A VINYLPHENYLPROPIONIC ACID DERIVATIVE AND METHOD FOR PRODUCING THE SAME JSR CORP 2001-11-13 JP disclosed
WO-2001036370-A1 VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS JSR CORPORATION (JP) 2001-05-25 WO disclosed