SCHEMBL29323749

SCHEMBL29323749

C=C(C)C(=O)Oc1ccc(S(=O)(=O)CC)cc1

nearest known ligand 0.51

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ELANE P08246 3/20 0.51
KMT2A Q03164 4/20 0.48
ATM Q13315 1/20 0.48
POLB P06746 2/20 0.47
ALDH1A1 P00352 2/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
MAPT P10636 1/20 0.47
PKM P14618 1/20 0.47
GAA P10253 2/20 0.45
HTT P42858 2/20 0.45
MEN1 O00255 1/20 0.45
LMNA P02545 1/20 0.45
PSIP1 O75475 2/20 0.41
NPY2R P49146 1/20 0.41
NPSR1 Q6W5P4 1/20 0.41
MMP2 P08253 3/20 0.40
MMP9 P14780 3/20 0.40
MMP14 P50281 3/20 0.40
MMP8 P22894 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1232411 0.84 PKM (0.67) ELANEKMT2AATMPOLBALDH1A1
SCHEMBL1436154 0.83 ELANE (0.54) ELANEKMT2AATMPOLBALDH1A1
SCHEMBL165385 0.82 POLB (0.69) ELANEKMT2APOLBALDH1A1SMN1; SMN2
SCHEMBL29323743 0.82 ELANE (0.55) ELANEKMT2AATMPOLBALDH1A1
Butane SCHEMBL15309676 0.82 ELANE (0.61) ELANEKMT2AATMPOLBALDH1A1
SCHEMBL56436 0.82 ELANE (0.69) ELANEKMT2AATMPOLBALDH1A1
SCHEMBL3248031 0.81 ALDH1A1 (0.50) ELANEKMT2AATMPOLBALDH1A1
SCHEMBL3269978 0.81 LMNA (0.59) ELANEKMT2AATMALDH1A1SMN1; SMN2
SCHEMBL961163 0.81 ELANE (0.53) ELANEKMT2AATMPOLBALDH1A1
SCHEMBL31729674 0.81 ELANE (0.53) ELANEKMT2AATMPOLBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed
US-20080038669-A1 NON-TRULY-SPHERICAL HIGH-MOLECULAR FINE PARTICLES, PROCESS FOR PRODUCING THE SAME, INKJET INK COMPOSITION CONTAINING FINE PARTICLES, LITHOGRAPHIC PRINTING PLATE USING THE SAME, PROCESS FOR PRODUCING PRINTING PLATE, AND ELECTROPHORETIC PARTICLES-CONTAINING COMPOSITION CONTAINING FINE PARTICLES FUJIFILM CORPORATION (JP) 2008-02-14 US disclosed
US-20080038669-A1 NON-TRULY-SPHERICAL HIGH-MOLECULAR FINE PARTICLES, PROCESS FOR PRODUCING THE SAME, INKJET INK COMPOSITION CONTAINING FINE PARTICLES, LITHOGRAPHIC PRINTING PLATE USING THE SAME, PROCESS FOR PRODUCING PRINTING PLATE, AND ELECTROPHORETIC PARTICLES-CONTAINING COMPOSITION CONTAINING FINE PARTICLES FUJIFILM CORPORATION (JP) 2008-02-14 US disclosed