SCHEMBL29323796

SCHEMBL29323796

C=Cc1ccc(C(=O)OCCS(=O)(=O)c2cccs2)cc1

nearest known ligand 0.49

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.49
HPGD P15428 2/20 0.49
LMNA P02545 1/20 0.49
TDP1 Q9NUW8 1/20 0.47
SMN1; SMN2 Q16637 2/20 0.43
RAB9A P51151 4/20 0.41
NPC1 O15118 3/20 0.41
MAPT P10636 6/20 0.40
MEN1 O00255 4/20 0.40
KMT2A Q03164 4/20 0.40
TP53 P04637 3/20 0.40
KDM4E B2RXH2 2/20 0.39
MAPK1 P28482 2/20 0.37
CASP3 P42574 1/20 0.37
SENP8 Q96LD8 1/20 0.37
SENP7 Q9BQF6 1/20 0.37
SENP6 Q9GZR1 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29323769 0.80 TDP1 (0.44) ALDH1A1LMNATDP1RAB9ANPC1
SCHEMBL29323762 0.78 SNCA (0.50) ALDH1A1LMNATDP1RAB9AMAPT
SCHEMBL29323779 0.77 TSHR (0.43) ALDH1A1HPGDLMNATDP1SMN1; SMN2
SCHEMBL12376769 0.77 TDP1 (0.43) ALDH1A1LMNATDP1SMN1; SMN2MAPK1
SCHEMBL29323767 0.75 KMT2A (0.44) ALDH1A1TDP1KMT2A
SCHEMBL29323772 0.75 ALDH1A1 (0.43) ALDH1A1HPGDLMNATDP1MAPT
SCHEMBL26417020 0.75 SNCA (0.49) ALDH1A1LMNATDP1SMN1; SMN2RAB9A
SCHEMBL29323709 0.74 NPC1 (0.46) ALDH1A1HPGDLMNATDP1SMN1; SMN2
SCHEMBL27570709 0.72 NPC1 (0.47) ALDH1A1HPGDLMNASMN1; SMN2RAB9A
SCHEMBL26417026 0.72 TDP1 (0.58) ALDH1A1HPGDLMNATDP1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed