SCHEMBL3872282

SCHEMBL3872282

O=S(=O)([O-])C(F)(F)C(F)(F)C1CC2CCC1C2.Oc1ccc([S+]2CCCC2)c2ccccc12

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CNR2 P34972 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5866195 0.86 ALDH1A1 (0.34)
SCHEMBL5648389 0.84 BCL2 (0.31)
SCHEMBL5866201 0.84 ALDH1A1 (0.39)
SCHEMBL29429148 0.82 SLC2A1 (0.36) CNR2
SCHEMBL447052 0.82 SLC2A1 (0.36) CNR2
Trifluoromethanesulfonic Acid SCHEMBL515598 0.81 LDHA (0.37)
Trifluoromethanesulfonic Acid SCHEMBL31168280 0.81 LDHA (0.37)
SCHEMBL5866371 0.80 CNR2 (0.32) CNR2
SCHEMBL516312 0.79 CA1 (0.34)
SCHEMBL515864 0.78 CA1 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7638261-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-12-29 US disclosed
US-20090148790-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-06-11 US disclosed
US-7521169-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-04-21 US disclosed
US-20060234153-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-10-19 US disclosed
EP-1557718-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2005-07-27 EP disclosed