Phosphocholine

Phosphocholine

SCHEMBL29533477

C[N+](C)(C)CCOP(=O)(O)O.O.[Cl-].[Na]

nearest known ligand 0.45

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Phosphocholine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRM5 known ✓ P08912 6/20 0.45
CHRM1 known ✓ P11229 6/20 0.45
CHRM3 known ✓ P20309 6/20 0.45
CHRM2 known ✓ P08172 5/20 0.43
CHRM4 known ✓ P08173 5/20 0.43
ADRA1A known ✓ P35348 2/20 0.43
ESR1 known ✓ P03372 1/20 0.43
ADORA3 known ✓ P0DMS8 1/20 0.43
AGTR1 known ✓ P30556 1/20 0.43
HTR1A known ✓ P08908 2/20 0.41
ADRA2A known ✓ P08913 1/20 0.41
ACHE known ✓ P22303 1/20 0.38
BBOX1 O75936 2/20 0.45
MAPT P10636 1/20 0.45
BLM P54132 1/20 0.45
LPAR3 Q9UBY5 3/20 0.43
LPAR1 Q92633 2/20 0.43
LPAR2 Q9HBW0 2/20 0.43
SMN1; SMN2 Q16637 3/20 0.43
LMNA P02545 3/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phosphocholine SCHEMBL18662889 1.00 CHRM5 (0.45) CHRM5CHRM1CHRM3BBOX1MAPT
Phosphocholine SCHEMBL18315379 0.98 CHRM5 (0.43) CHRM5CHRM1CHRM3BBOX1MAPT
Phosphocholine SCHEMBL18315378 0.98 CHRM5 (0.43) CHRM5CHRM1CHRM3BBOX1MAPT
Phosphocholine SCHEMBL24426 0.98 CHRM5 (0.46) CHRM5CHRM1CHRM3BBOX1MAPT
Phosphocholine SCHEMBL17373733 0.98 LPAR3 (0.45) CHRM5CHRM1CHRM3BBOX1MAPT
Phosphocholine SCHEMBL30080880 0.98 CHRM5 (0.46) CHRM5CHRM1CHRM3BBOX1MAPT
Phosphocholine SCHEMBL2355628 0.95 CHRM5 (0.45) CHRM5CHRM1CHRM3BBOX1MAPT
Phosphocholine SCHEMBL5143798 0.95 CHRM5 (0.45) CHRM5CHRM1CHRM3BBOX1MAPT
Phosphocholine SCHEMBL20838517 0.95 CHRM5 (0.45) CHRM5CHRM1CHRM3BBOX1MAPT
Phosphocholine SCHEMBL10717805 0.95 CHRM5 (0.45) CHRM5CHRM1CHRM3BBOX1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230279266-A1 POLISHING LIQUID COMPOSITION FOR SILICON OXIDE FILMS KAO CORPORATION (JP) 2023-09-07 US disclosed
CN-116323843-A Polishing composition for silicon oxide film 花王株式会社 2023-06-23 CN disclosed
WO-2022075179-A1 POLISHING LIQUID COMPOSITION FOR SILICON OXIDE FILMS 花王株式会社 2022-04-14 WO disclosed