SCHEMBL2961941

SCHEMBL2961941

CC(C)(C)c1ccc([I+](OS(=O)(=O)c2ccc(F)cc2)c2ccc(C(C)(C)C)cc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 4/20 0.44
HSD17B3 P37058 1/20 0.44
ALDH1A1 P00352 8/20 0.42
MEN1 O00255 4/20 0.40
KMT2A Q03164 4/20 0.40
MAPT P10636 4/20 0.40
SMN1; SMN2 Q16637 3/20 0.40
MAPK1 P28482 2/20 0.40
HTT P42858 2/20 0.40
NPC1 O15118 2/20 0.40
RAB9A P51151 2/20 0.40
XBP1 P17861 1/20 0.40
RECQL P46063 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
NR1I2 O75469 1/20 0.37
CYP3A4 P08684 2/20 0.37
CYP1A2 P05177 1/20 0.37
CYP2C19 P33261 1/20 0.37
CYP2C9 P11712 1/20 0.37
GPR183 P32249 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3757628 0.94 HSD11B1 (0.41) HSD11B1HSD17B3ALDH1A1MEN1KMT2A
SCHEMBL503481 0.88 ALDH1A1 (0.42) HSD11B1HSD17B3ALDH1A1MEN1KMT2A
SCHEMBL51291 0.86 TSHR (0.47) HSD11B1HSD17B3ALDH1A1MEN1KMT2A
SCHEMBL5412257 0.86 HSD11B1 (0.38) HSD11B1HSD17B3ALDH1A1MEN1KMT2A
SCHEMBL5699281 0.85 UQCRB (0.50) HSD11B1HSD17B3ALDH1A1MEN1KMT2A
SCHEMBL452775 0.84 HSD11B1 (0.47) HSD11B1HSD17B3ALDH1A1MEN1KMT2A
SCHEMBL5699308 0.84 HSD11B1 (0.47) HSD11B1HSD17B3ALDH1A1MEN1KMT2A
SCHEMBL5412396 0.83 PTGER2 (0.37) HSD11B1HSD17B3ALDH1A1NPC1RAB9A
SCHEMBL5382705 0.83 ACHE (0.43) ALDH1A1MEN1KMT2AL3MBTL1GAA
SCHEMBL5400819 0.83 ACHE (0.43) ALDH1A1MEN1KMT2AL3MBTL1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7759045-B2 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-07-20 US disclosed
US-20090004601-A1 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-01-01 US disclosed
US-7312014-B2 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2007-12-25 US disclosed
US-20040170918-A1 Poly(p-hydroxystyrene/styrene/alkyl acrylate) terpolymer derivative and acid generator comprising triphenylsulfonium benzenesulfonate derivative; forming positive pattern using transcription technology in high vacuum with irradiated energy such as electron beam, extreme ultraviolet ray and X-ray WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2004-09-02 US disclosed
EP-1406123-A1 RESIST COMPOSITIONS Wako Pure Chemical Industries, Ltd. (JP) 2004-04-07 EP disclosed
US-20030068573-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-10 US disclosed