Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 3/20 | 0.47 |
| ▸ | MAPT | P10636 | 2/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.43 |
| ▸ | RECQL | P46063 | 2/20 | 0.43 |
| ▸ | LMNA | P02545 | 2/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.43 |
| ▸ | PKM | P14618 | 1/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.43 |
| ▸ | APEX1 | P27695 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.42 |
| ▸ | TP53 | P04637 | 1/20 | 0.42 |
| ▸ | CA1 | P00915 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
| ▸ | CA9 | Q16790 | 1/20 | 0.41 |
| ▸ | HSD17B3 | P37058 | 1/20 | 0.40 |
| ▸ | NR1I2 | O75469 | 2/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL51291 | 0.85 | TSHR (0.47) | HSD11B1MAPTALDH1A1RECQLLMNA | |
| SCHEMBL503481 | 0.84 | ALDH1A1 (0.42) | HSD11B1MAPTALDH1A1RECQLLMNA | |
| SCHEMBL2961941 | 0.84 | HSD11B1 (0.44) | HSD11B1MAPTALDH1A1RECQLLMNA | |
| SCHEMBL5699281 | 0.84 | UQCRB (0.50) | HSD11B1MAPTALDH1A1RECQLLMNA | |
| SCHEMBL5709660 | 0.83 | MEN1 (0.51) | HSD11B1MAPTALDH1A1RECQLLMNA | |
| SCHEMBL244142 | 0.83 | ALDH1A1 (0.50) | MAPTALDH1A1LMNAPKMMEN1 | |
| SCHEMBL452775 | 0.83 | HSD11B1 (0.47) | HSD11B1MAPTALDH1A1RECQLTDP1 | |
| SCHEMBL4655810 | 0.82 | NOX4 (0.47) | HSD11B1ALDH1A1LMNATDP1PKM | |
| SCHEMBL2634850 | 0.81 | LMNA (0.50) | ALDH1A1LMNATDP1PKMSMN1; SMN2 | |
| SCHEMBL4655792 | 0.80 | HTT (0.45) | HSD11B1ALDH1A1LMNATDP1PKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1295177-B1 | STRONGLY WATER-SOLUBLE PHOTOACID GENERATOR RESIST COMPOSITIONS | INFINEON TECHNOLOGIES AG (DE) | 2006-08-09 | — | — | EP | disclosed |
| EP-0907109-B1 | Process for device fabrication using a radiation-sensitive resist material | LUCENT TECHNOLOGIES INC (US) | 2005-11-16 | — | — | EP | disclosed |
| EP-1295177-A2 | STRONGLY WATER-SOLUBLE PHOTOACID GENERATOR RESIST COMPOSITIONS | Infineon Technologies North America Corp. (US) | 2003-03-26 | — | — | EP | disclosed |
| US-6383715-B1 | RESIST FOR ELIMINATING BLOB DEFECTS USED TO PRODUCE SEMICONDUCTOR DEFECTS WITH BASE POLYMER WITH PROTECTED GROUPS, SOLVENT AND PHOTOACID GENERATING IODINIUM SALT AND WATER SOLUBLE HYDROXYL GROUP | INFINEON TECHNOLOGIES AG (DE) | 2002-05-07 | — | — | US | disclosed |
| WO-2002001296-A2 | STRONGLY WATER-SOLUBLE PHOTOACID GENERATOR RESIST COMPOSITIONS | INFINEON TECHNOLOGIES NORTH AMERICA CORP. (US) | 2002-01-03 | — | — | WO | disclosed |
| US-5998099-A | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material | LUCENT TECHNOLOGIES INC. (US) | 1999-12-07 | — | — | US | disclosed |
| EP-0907109-A1 | Process for device fabrication using a radiation-sensitive resist material | LUCENT TECHNOLOGIES INC. (US) | 1999-04-07 | — | — | EP | disclosed |
| EP-0848288-A1 | Resist materials | LUCENT TECHNOLOGIES INC. (US) | 1998-06-17 | — | — | EP | disclosed |