SCHEMBL7784307

SCHEMBL7784307

Cc1ccccc1S(=O)(=O)ON1C(=O)c2ccccc2C1=O

nearest known ligand 0.73

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 10/20 0.73
KMT2A Q03164 10/20 0.73
MAPT P10636 9/20 0.73
ALDH1A1 P00352 9/20 0.73
F2 P00734 4/20 0.73
HTT P42858 3/20 0.73
XBP1 P17861 2/20 0.73
HPGD P15428 8/20 0.72
MEN1 O00255 7/20 0.72
LMNA P02545 2/20 0.72
SMN1; SMN2 Q16637 1/20 0.72
VDR P11473 3/20 0.64
CYP1A2 P05177 2/20 0.63
CYP2C19 P33261 2/20 0.63
CYP3A4 P08684 1/20 0.63
NPSR1 Q6W5P4 1/20 0.63
CYP2C9 P11712 1/20 0.43
ESR1 P03372 1/20 0.42
GAA P10253 1/20 0.42
ESR2 Q92731 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28618961 0.88 KDM4E (0.66) KDM4EKMT2AMAPTALDH1A1F2
SCHEMBL14509425 0.83 KDM4E (0.77) KDM4EKMT2AMAPTALDH1A1F2
SCHEMBL31314906 0.81 KMT2A (0.50) KDM4EKMT2AMAPTALDH1A1F2
SCHEMBL29420760 0.80 KMT2A (0.64) KDM4EKMT2AMAPTALDH1A1F2
SCHEMBL1059497 0.80 KMT2A (0.64) KDM4EKMT2AMAPTALDH1A1F2
SCHEMBL2962362 0.80 PARL (0.62) KDM4EKMT2AMAPTALDH1A1F2
SCHEMBL64277 0.78 VDR (1.00) KDM4EKMT2AMAPTALDH1A1F2
SCHEMBL29370293 0.78 VDR (1.00) KDM4EKMT2AMAPTALDH1A1F2
SCHEMBL29761819 0.78 KDM4E (0.73) KDM4EKMT2AMAPTALDH1A1F2
SCHEMBL5557975 0.78 KDM4E (0.73) KDM4EKMT2AMAPTALDH1A1F2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119823306-A Polymer, resist composition including the same, and method of forming pattern using the same 三星电子株式会社 2025-04-15 CN disclosed
CN-116368959-A Quantum dot material solution, method for forming quantum dot layer, array substrate, display panel and method for manufacturing display panel 京东方科技集团股份有限公司 2023-06-30 CN disclosed
CN-111198480-A Photosensitive resin composition, pattern forming method and antireflection film 信越化学工业株式会社 2020-05-26 CN disclosed
CN-110727175-A Photosensitive resin composition and pattern forming method 信越化学工业株式会社 2020-01-24 CN disclosed
CN-110727174-A Photosensitive resin composition, photosensitive resin coating, photosensitive dry film and black matrix 信越化学工业株式会社 2020-01-24 CN disclosed
EP-0827970-B1 New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials CLARIANT FINANCE BVI LTD (VG) 2001-09-26 EP disclosed
US-5866306-A POLYALKYLPHENYLSILANE INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1999-02-02 US disclosed
US-5852128-A Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials CLARIANT AG (CH) 1998-12-22 US disclosed
EP-0827970-A2 New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials Clariant AG (CH) 1998-03-11 EP disclosed
EP-0502662-A1 Process for use of photosensitive polysilanes as a photoresist International Business Machines Corporation (US) 1992-09-09 EP disclosed