Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 4/20 | 0.42 |
| ▸ | RAB9A | P51151 | 4/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.42 |
| ▸ | F2 | P00734 | 2/20 | 0.40 |
| ▸ | PRSS1 | P07477 | 2/20 | 0.40 |
| ▸ | PRSS2 | P07478 | 2/20 | 0.40 |
| ▸ | PRSS3 | P35030 | 2/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | TUBB4A | P04350 | 2/20 | 0.38 |
| ▸ | TUBB | P07437 | 2/20 | 0.38 |
| ▸ | TUBA3C | P0DPH7 | 2/20 | 0.38 |
| ▸ | TUBA1B | P68363 | 2/20 | 0.38 |
| ▸ | TUBA4A | P68366 | 2/20 | 0.38 |
| ▸ | TUBB4B | P68371 | 2/20 | 0.38 |
| ▸ | TUBB3 | Q13509 | 2/20 | 0.38 |
| ▸ | TUBB2A | Q13885 | 2/20 | 0.38 |
| ▸ | TUBB8 | Q3ZCM7 | 2/20 | 0.38 |
| ▸ | TUBA3E | Q6PEY2 | 2/20 | 0.38 |
| ▸ | TUBA1A | Q71U36 | 2/20 | 0.38 |
| ▸ | TUBA1C | Q9BQE3 | 2/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4350592 | 1.00 | NPC1 (0.42) | NPC1RAB9AKMT2AF2PRSS1 | |
| SCHEMBL30529837 | 1.00 | NPC1 (0.42) | NPC1RAB9AKMT2AF2PRSS1 | |
| SCHEMBL29761878 | 0.88 | F2 (0.40) | F2PRSS1PRSS2PRSS3HSP90AA1 | |
| SCHEMBL5367442 | 0.88 | F2 (0.40) | F2PRSS1PRSS2PRSS3HSP90AA1 | |
| SCHEMBL6741146 | 0.88 | F2 (0.40) | F2PRSS1PRSS2PRSS3HSP90AA1 | |
| SCHEMBL6809982 | 0.85 | POLB (0.38) | NPC1RAB9AKMT2APOLBL3MBTL1 | |
| SCHEMBL36764 | 0.84 | KMT2A (0.42) | NPC1RAB9AKMT2AF2L3MBTL1 | |
| SCHEMBL36763 | 0.84 | KMT2A (0.42) | NPC1RAB9AKMT2AF2L3MBTL1 | |
| SCHEMBL29359430 | 0.84 | KMT2A (0.42) | NPC1RAB9AKMT2AF2L3MBTL1 | |
| SCHEMBL36510 | 0.81 | HSD11B1 (0.46) | NPC1RAB9AKMT2AL3MBTL1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6245930-B1 | AN OXIMESULFONATE COMPOUND CAPABLE OF GIVING POSITIVELY OR NEGATIVELY PATTERNED RESIST LAYER OF EXCELLENT PATTERN RESOLUTION, CROSS SECTIOANL PROFILE, AND HIGH SENSITIVITY | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-06-12 | — | — | US | claimed |
| US-6042988-A | ALKALI-SOLUBLE RESIN, A COMPOUND CAPABLE OF GENERATING AN ACID BY IRRADIATION AND A CROSSLINKING AGENT, AND FURTHER CONTAINS AN ORGANIC CARBOXYLIC ACID AS ACIDIC COMPOUND AND ORGANIC AMINE AS ALKALINE COMPOUND; DEFINITION AND PRECISION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-03-28 | — | — | US | claimed |
| US-5976760-A | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-11-02 | — | — | US | claimed |
| CN-116583784-A | Resist composition and resist pattern forming method | 东京应化工业株式会社 | 2023-08-11 | — | — | CN | disclosed |
| CN-112987497-A | Resist composition and resist pattern forming method | 东京应化工业株式会社 | 2021-06-18 | — | — | CN | disclosed |
| US-20090207286-A1 | Colored photosensitive composition, and color filter array and solid image pickup device using the same | SONY CORPORATION (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20090207287-A1 | Colored photosensitive composition, and color filter array and solid image pickup device using the same | SONY CORPORATION (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20080237553-A1 | Colored photosensitive resin composition, and color filter array and solid-state image pickup device using the same | SUMITOMO CHEMICAL COMPANY, LIMITED | 2008-10-02 | — | — | US | disclosed |
| US-20080237554-A1 | Colored photosensitive resin composition, and color filter array and solid-state image pickup device using the same | SUMITOMO CHEMICAL COMPANY LIMITED | 2008-10-02 | — | — | US | disclosed |
| US-20070287086-A1 | Colored photosensitive resin composition, color filter, image sensor, and camera system | SONY CORPORATION (JP) | 2007-12-13 | — | — | US | disclosed |
| US-20070287087-A1 | Colored photosensitive resin composition, color filter, image sensor, and camera system | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-12-13 | — | — | US | disclosed |
| EP-0821274-B1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2001-11-14 | — | — | EP | disclosed |
| US-6268108-B1 | MIXTURE OF COMPOUND FORMING ACID UPON EXPOSURE OF ACTINIC RADIATION, COMPOUND CAPABLE OF CROSSLINKING, DYE AND SOLVENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-07-31 | — | — | US | disclosed |
| US-6245930-B1 | AN OXIMESULFONATE COMPOUND CAPABLE OF GIVING POSITIVELY OR NEGATIVELY PATTERNED RESIST LAYER OF EXCELLENT PATTERN RESOLUTION, CROSS SECTIOANL PROFILE, AND HIGH SENSITIVITY | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-06-12 | — | — | US | disclosed |
| US-6042988-A | ALKALI-SOLUBLE RESIN, A COMPOUND CAPABLE OF GENERATING AN ACID BY IRRADIATION AND A CROSSLINKING AGENT, AND FURTHER CONTAINS AN ORGANIC CARBOXYLIC ACID AS ACIDIC COMPOUND AND ORGANIC AMINE AS ALKALINE COMPOUND; DEFINITION AND PRECISION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-03-28 | — | — | US | disclosed |
| US-5976760-A | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-11-02 | — | — | US | disclosed |
| US-5928837-A | Negative-working chemical-sensitization photoresist composition comprising oxime sulfonate compounds | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-07-27 | — | — | US | disclosed |
| US-5817444-A | POLYHYDROXYSTYRENE SUBSTITUTED WITH TETRAHYDROPYRAN GROUPS, POLYHYDROXYSTYRENE SUBSTITUTED WITH ALKOXYALKYL GROUPS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-10-06 | — | — | US | disclosed |
| EP-0848289-A1 | Negative-working chemical sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-06-17 | — | — | EP | disclosed |
| EP-0821274-A1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-01-28 | — | — | EP | disclosed |