Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.36 |
| ▸ | GNG2 | P59768 | 1/20 | 0.33 |
| ▸ | GNB1 | P62873 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL114129 | 0.84 | KDM4E (0.43) | KDM4EGNG2GNB1ALDH1A1HSD17B10 | |
| Hydrochloric Acid SCHEMBL30431952 | 0.83 | KDM4E (0.42) | KDM4EGNG2GNB1ALDH1A1HSD17B10 | |
| Hydrochloric Acid SCHEMBL27752560 | 0.83 | KDM4E (0.42) | KDM4EGNG2GNB1ALDH1A1HSD17B10 | |
| SCHEMBL5134183 | 0.77 | ALDH1A1 (0.43) | KDM4EGNG2GNB1ALDH1A1HSD17B10 | |
| SCHEMBL863274 | 0.77 | ALDH1A1 (0.43) | KDM4EGNG2GNB1ALDH1A1HSD17B10 | |
| SCHEMBL10048542 | 0.73 | APAF1 (0.41) | KDM4EGNG2GNB1ALDH1A1 | |
| SCHEMBL863067 | 0.73 | GNG2 (0.40) | KDM4EGNG2GNB1ALDH1A1 | |
| Sulfuric Acid SCHEMBL4915014 | 0.71 | KDM4E (0.41) | KDM4EGNG2GNB1ALDH1A1HSD17B10 | |
| SCHEMBL27752559 | 0.71 | KDM4E (0.35) | KDM4EGNG2GNB1ALDH1A1 | |
| SCHEMBL10045054 | 0.71 | S100B (0.46) | KDM4EGNG2GNB1ALDH1A1HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7786303-B2 | Acidic bath for electrolytically depositing a copper deposit containing halogenated or pseudohalogenated monomeric phenazinium compounds | ATOTECH DEUTSCHLAND GMBH (DE) | 2010-08-31 | — | — | US | claimed |
| EP-1720842-B1 | ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS | ATOTECH DEUTSCHLAND GMBH (DE) | 2008-05-07 | — | — | EP | claimed |
| US-20070108062-A1 | 7-Amino-2,8-dimethyl-3-thiocyanato-5-phenyl-phenazinium tetrafluooroboride; uniform and mirror bright copper coatings that are leveled and ductile as well using a relatively high current density; quality; high purity for decoative coatings; durable bath operation | ATOTECH DEUTSCHLAND GMBH (DE) | 2007-05-17 | — | — | US | claimed |
| EP-1720842-A1 | ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS | ATOTECH DEUTSCHLAND GMBH (DE) | 2006-11-15 | — | — | EP | claimed |
| WO-2005049584-A1 | ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS | ATOTECH DEUTSCHLAND GMBH (DE) | 2005-06-02 | — | — | WO | claimed |
| US-7786303-B2 | Acidic bath for electrolytically depositing a copper deposit containing halogenated or pseudohalogenated monomeric phenazinium compounds | ATOTECH DEUTSCHLAND GMBH (DE) | 2010-08-31 | — | — | US | disclosed |
| EP-1720842-B1 | ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS | ATOTECH DEUTSCHLAND GMBH (DE) | 2008-05-07 | — | — | EP | disclosed |
| US-20070108062-A1 | 7-Amino-2,8-dimethyl-3-thiocyanato-5-phenyl-phenazinium tetrafluooroboride; uniform and mirror bright copper coatings that are leveled and ductile as well using a relatively high current density; quality; high purity for decoative coatings; durable bath operation | ATOTECH DEUTSCHLAND GMBH (DE) | 2007-05-17 | — | — | US | disclosed |
| EP-1720842-A1 | ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS | ATOTECH DEUTSCHLAND GMBH (DE) | 2006-11-15 | — | — | EP | disclosed |
| WO-2005049584-A1 | ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS | ATOTECH DEUTSCHLAND GMBH (DE) | 2005-06-02 | — | — | WO | disclosed |