SCHEMBL30457792

SCHEMBL30457792

Cc1ccc(S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)c2c(C)cc(C)cc2C)c(C)c1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAPGEF4 Q8WZA2 5/20 0.40
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
MMP1 P03956 1/20 0.38
MMP2 P08253 1/20 0.38
MMP9 P14780 1/20 0.38
MMP8 P22894 1/20 0.38
MMP13 P45452 1/20 0.38
MEP1B Q16820 1/20 0.38
ALDH1A1 P00352 4/20 0.36
HPGD P15428 2/20 0.36
POLB P06746 2/20 0.36
GFER P55789 2/20 0.36
MAPT P10636 2/20 0.36
ALOX12 P18054 1/20 0.36
KMT2A Q03164 2/20 0.35
HSD17B10 Q99714 1/20 0.35
F2 P00734 2/20 0.35
PRSS1 P07477 1/20 0.35
PRSS2 P07478 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3165992 1.00 RAPGEF4 (0.40) RAPGEF4CA1CA2MMP1MMP2
SCHEMBL29362738 0.92 RAPGEF4 (0.44) RAPGEF4MEP1BALDH1A1HPGDPOLB
SCHEMBL36946 0.92 RAPGEF4 (0.44) RAPGEF4MEP1BALDH1A1HPGDPOLB
SCHEMBL6932778 0.87 CA1 (0.47) RAPGEF4CA1CA2MMP1MMP2
SCHEMBL10179468 0.85 RAPGEF4 (0.40) RAPGEF4MEP1BALDH1A1HPGDPOLB
SCHEMBL15101771 0.85 RAPGEF4 (0.43) RAPGEF4MEP1BALDH1A1HPGDPOLB
SCHEMBL3166189 0.84 RAPGEF4 (0.39) RAPGEF4MEP1BALDH1A1HPGDPOLB
SCHEMBL30458256 0.84 RAPGEF4 (0.39) RAPGEF4MEP1BALDH1A1HPGDPOLB
SCHEMBL6934542 0.79 ALDH1A1 (0.44) ALDH1A1HPGDMAPTKMT2AF2
SCHEMBL3181053 0.79 FFAR4 (0.44) RAPGEF4CA1CA2MMP1MMP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122072436-A Negative photosensitive resin composition, cured film, and resist film DIC株式会社 2026-05-22 CN disclosed
CN-119575759-A Positive photosensitive resin composition, photosensitive film, resist underlayer film, resist permanent film, and method for producing film DIC株式会社 2025-03-07 CN disclosed
CN-113348188-B Phenolic hydroxyl group-containing resin, photosensitive composition, resist film, curable composition, and cured product DIC株式会社 2024-05-10 CN disclosed
CN-118011733-A Positive photosensitive resin composition, resist film, resist underlayer film, and resist permanent film DIC株式会社 2024-05-10 CN disclosed
CN-117075428-A Negative photosensitive resin composition DIC株式会社 2023-11-17 CN disclosed
CN-110959138-B Resist material DIC株式会社 2023-06-30 CN disclosed