SCHEMBL30458256

SCHEMBL30458256

Cc1ccc(S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)c2ccc(C)c(C)c2C)c(C)c1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAPGEF4 Q8WZA2 1/20 0.39
GAA P10253 3/20 0.37
MEP1B Q16820 1/20 0.37
ALDH1A1 P00352 5/20 0.35
HPGD P15428 2/20 0.35
MAPT P10636 2/20 0.35
TSHR P16473 1/20 0.35
POLB P06746 1/20 0.35
ALOX12 P18054 1/20 0.35
GFER P55789 1/20 0.35
KMT2A Q03164 2/20 0.35
HSD17B10 Q99714 1/20 0.35
LMNA P02545 3/20 0.34
SMN1; SMN2 Q16637 3/20 0.34
MEN1 O00255 1/20 0.34
MAP1LC3B Q9GZQ8 1/20 0.34
KDM4E B2RXH2 1/20 0.33
F2 P00734 1/20 0.33
ATM Q13315 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3166189 1.00 RAPGEF4 (0.39) RAPGEF4GAAMEP1BALDH1A1HPGD
SCHEMBL36946 0.91 RAPGEF4 (0.44) RAPGEF4GAAMEP1BALDH1A1HPGD
SCHEMBL29362738 0.91 RAPGEF4 (0.44) RAPGEF4GAAMEP1BALDH1A1HPGD
SCHEMBL15101771 0.84 RAPGEF4 (0.43) RAPGEF4GAAMEP1BALDH1A1HPGD
SCHEMBL30457792 0.84 RAPGEF4 (0.40) RAPGEF4GAAMEP1BALDH1A1HPGD
SCHEMBL10179468 0.84 RAPGEF4 (0.40) RAPGEF4GAAMEP1BALDH1A1HPGD
SCHEMBL3165992 0.84 RAPGEF4 (0.40) RAPGEF4GAAMEP1BALDH1A1HPGD
SCHEMBL6934542 0.81 ALDH1A1 (0.44) GAAALDH1A1HPGDMAPTTSHR
SCHEMBL3170786 0.79 ALDH1A1 (0.35) GAAALDH1A1MAPTTSHRPOLB
SCHEMBL31399011 0.79 ALDH1A1 (0.35) GAAALDH1A1MAPTTSHRPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122072436-A Negative photosensitive resin composition, cured film, and resist film DIC株式会社 2026-05-22 CN disclosed
CN-119575759-A Positive photosensitive resin composition, photosensitive film, resist underlayer film, resist permanent film, and method for producing film DIC株式会社 2025-03-07 CN disclosed
CN-113348188-B Phenolic hydroxyl group-containing resin, photosensitive composition, resist film, curable composition, and cured product DIC株式会社 2024-05-10 CN disclosed
CN-118011733-A Positive photosensitive resin composition, resist film, resist underlayer film, and resist permanent film DIC株式会社 2024-05-10 CN disclosed
CN-117075428-A Negative photosensitive resin composition DIC株式会社 2023-11-17 CN disclosed
CN-110959138-B Resist material DIC株式会社 2023-06-30 CN disclosed