Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RAPGEF4 | Q8WZA2 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 3/20 | 0.37 |
| ▸ | MEP1B | Q16820 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.35 |
| ▸ | HPGD | P15428 | 2/20 | 0.35 |
| ▸ | MAPT | P10636 | 2/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.35 |
| ▸ | GFER | P55789 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 3/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | MAP1LC3B | Q9GZQ8 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | F2 | P00734 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30458256 | 1.00 | RAPGEF4 (0.39) | RAPGEF4GAAMEP1BALDH1A1HPGD | |
| SCHEMBL36946 | 0.91 | RAPGEF4 (0.44) | RAPGEF4GAAMEP1BALDH1A1HPGD | |
| SCHEMBL29362738 | 0.91 | RAPGEF4 (0.44) | RAPGEF4GAAMEP1BALDH1A1HPGD | |
| SCHEMBL15101771 | 0.84 | RAPGEF4 (0.43) | RAPGEF4GAAMEP1BALDH1A1HPGD | |
| SCHEMBL30457792 | 0.84 | RAPGEF4 (0.40) | RAPGEF4GAAMEP1BALDH1A1HPGD | |
| SCHEMBL10179468 | 0.84 | RAPGEF4 (0.40) | RAPGEF4GAAMEP1BALDH1A1HPGD | |
| SCHEMBL3165992 | 0.84 | RAPGEF4 (0.40) | RAPGEF4GAAMEP1BALDH1A1HPGD | |
| SCHEMBL6934542 | 0.81 | ALDH1A1 (0.44) | GAAALDH1A1HPGDMAPTTSHR | |
| SCHEMBL3170786 | 0.79 | ALDH1A1 (0.35) | GAAALDH1A1MAPTTSHRPOLB | |
| SCHEMBL31399011 | 0.79 | ALDH1A1 (0.35) | GAAALDH1A1MAPTTSHRPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113348188-B | Phenolic hydroxyl group-containing resin, photosensitive composition, resist film, curable composition, and cured product | DIC株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-118011733-A | Positive photosensitive resin composition, resist film, resist underlayer film, and resist permanent film | DIC株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-117075428-A | Negative photosensitive resin composition | DIC株式会社 | 2023-11-17 | — | — | CN | disclosed |
| CN-110959138-B | Resist material | DIC株式会社 | 2023-06-30 | — | — | CN | disclosed |
| US-11487204-B2 | Resist material | DIC CORPORATION (JP) | 2022-11-01 | — | — | US | disclosed |
| CN-113348188-A | Phenolic hydroxyl group-containing resin, photosensitive composition, resist film, curable composition, and cured product | DIC株式会社 | 2021-09-03 | — | — | CN | disclosed |
| CN-108368214-B | Novolac resin and resist film | DIC株式会社 | 2021-03-23 | — | — | CN | disclosed |
| CN-108368213-B | Novolac resin and resist film | DIC株式会社 | 2020-12-18 | — | — | CN | disclosed |
| CN-107003612-B | Photosensitive composition for forming resist underlayer film, and resist underlayer film | DIC株式会社 | 2020-11-06 | — | — | CN | disclosed |
| US-20200166838-A1 | RESIST MATERIAL | DIC CORPORATION (JP) | 2020-05-28 | — | — | US | disclosed |
| US-7115690-B2 | Fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer | DAIKIN INDUSTRIES, LTD. (JP) | 2006-10-03 | — | — | US | disclosed |
| US-20060204893-A1 | Novel fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer | DAIKIN INDUSTRIES, LTD. | 2006-09-14 | — | — | US | disclosed |
| US-20050287471-A1 | Novel fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same | DAIKIN INDUSTRIES, LTD. | 2005-12-29 | — | — | US | disclosed |
| US-6908724-B2 | Fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same | DAIKIN INDUSTRIES, LTD. (JP) | 2005-06-21 | — | — | US | disclosed |
| US-20040214103-A1 | Process for preparing fluorine-containing norbornene derivative | DAIKIN INDUSTRIES, LTD. | 2004-10-28 | — | — | US | disclosed |
| US-20040191680-A1 | Novel fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer | DAIKIN INDUSTRIES, LTD. | 2004-09-30 | — | — | US | disclosed |
| EP-1449860-A1 | NOVEL FLUOROPOLYMER, RESIST COMPOSITIONS CONTAINING THE SAME, AND NOVEL FLUOROMONOMERS | Daikin Industries, Ltd. (JP) | 2004-08-25 | — | — | EP | disclosed |
| EP-1415974-A1 | PROCESS FOR PRODUCTION OF FLUORINE-CONTAINING NORBORNENE DERIVATIVES | Daikin Industries, Ltd. (JP) | 2004-05-06 | — | — | EP | disclosed |
| US-20030152864-A1 | Novel fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same | DAIKIN INDUSTRIES, LTD. | 2003-08-14 | — | — | US | disclosed |
| EP-1275666-A1 | NOVEL FLUOROPOLYMER HAVING ACID-REACTIVE GROUP AND CHEMICAL AMPLIFICATION TYPE PHOTORESIST COMPOSITION CONTAINING THE SAME | Daikin Industries, Ltd. (JP) | 2003-01-15 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11487204-B2 | Resist material | FLNA, AFF1, RXRA | RAPGEF4 2952/4885GAA 4813/4885MEP1B 1903/4885 |
| US-20200166838-A1 | RESIST MATERIAL | FLNA, AFF1, RXRA | RAPGEF4 2952/4885GAA 4813/4885MEP1B 1903/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.