Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | PSIP1 | O75475 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 4/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.33 |
| ▸ | MAPT | P10636 | 3/20 | 0.33 |
| ▸ | LMNA | P02545 | 3/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.33 |
| ▸ | TP53 | P04637 | 2/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | CYTH2 | Q99418 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31399011 | 1.00 | ALDH1A1 (0.35) | ALDH1A1L3MBTL1KDM4EPSIP1TSHR | |
| SCHEMBL65095 | 0.80 | SMN1; SMN2 (0.46) | ALDH1A1L3MBTL1PSIP1TSHRHSD17B10 | |
| SCHEMBL3166189 | 0.79 | RAPGEF4 (0.39) | ALDH1A1L3MBTL1KDM4ETSHRHSD17B10 | |
| SCHEMBL30458256 | 0.79 | RAPGEF4 (0.39) | ALDH1A1L3MBTL1KDM4ETSHRHSD17B10 | |
| SCHEMBL3896326 | 0.78 | GAA (0.38) | ALDH1A1L3MBTL1KDM4EMAPTLMNA | |
| SCHEMBL64020 | 0.78 | KMT2A (0.39) | ALDH1A1L3MBTL1KDM4ETSHRGAA | |
| SCHEMBL21838871 | 0.78 | MAPT (0.47) | ALDH1A1L3MBTL1KDM4EMAPTLMNA | |
| SCHEMBL14600187 | 0.78 | MAPT (0.47) | ALDH1A1L3MBTL1KDM4EMAPTLMNA | |
| SCHEMBL3181053 | 0.75 | FFAR4 (0.44) | L3MBTL1MAPTLMNASMN1; SMN2HTT | |
| SCHEMBL3203604 | 0.74 | HSD11B1 (0.39) | ALDH1A1PSIP1TSHRHSD17B10MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11487204-B2 | Resist material | DIC CORPORATION (JP) | 2022-11-01 | — | — | US | disclosed |
| CN-108368213-B | Novolac resin and resist film | DIC株式会社 | 2020-12-18 | — | — | CN | disclosed |
| CN-107003612-B | Photosensitive composition for forming resist underlayer film, and resist underlayer film | DIC株式会社 | 2020-11-06 | — | — | CN | disclosed |
| US-20200166838-A1 | RESIST MATERIAL | DIC CORPORATION (JP) | 2020-05-28 | — | — | US | disclosed |
| CN-105190439-B | Modified novolac type phenolic resin, erosion resistant, film and permanent film against corrosion | DIC株式会社 | 2019-05-17 | — | — | CN | disclosed |
| CN-107001550-B | Novolak phenolics, its manufacturing method, photosensitive composite, erosion resistant and film | DIC株式会社 | 2019-04-02 | — | — | CN | disclosed |
| US-20180346635-A1 | NOVOLAC RESIN AND RESIST FILM | DIC CORPORATION (JP) | 2018-12-06 | — | — | US | disclosed |
| US-20180334523-A1 | NOVOLAC RESIN AND RESIST FILM | DIC CORPORATION (JP) | 2018-11-22 | — | — | US | disclosed |
| CN-108368213-A | Phenolic varnish type resin and etchant resist | DIC株式会社 | 2018-08-03 | — | — | CN | disclosed |
| US-9975830-B2 | Compound containing modified phenolic hydroxy group, method for producing compound containing modified phenolic hydroxy group, photosensitive composition, resist material, and resist coating film | DIC CORPORATION (JP) | 2018-05-22 | — | — | US | disclosed |
| US-7115690-B2 | Fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer | DAIKIN INDUSTRIES, LTD. (JP) | 2006-10-03 | — | — | US | disclosed |
| US-20060204893-A1 | Novel fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer | DAIKIN INDUSTRIES, LTD. | 2006-09-14 | — | — | US | disclosed |
| US-20050287471-A1 | Novel fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same | DAIKIN INDUSTRIES, LTD. | 2005-12-29 | — | — | US | disclosed |
| US-6908724-B2 | Fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same | DAIKIN INDUSTRIES, LTD. (JP) | 2005-06-21 | — | — | US | disclosed |
| US-20040214103-A1 | Process for preparing fluorine-containing norbornene derivative | DAIKIN INDUSTRIES, LTD. | 2004-10-28 | — | — | US | disclosed |
| US-20040191680-A1 | Novel fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer | DAIKIN INDUSTRIES, LTD. | 2004-09-30 | — | — | US | disclosed |
| EP-1449860-A1 | NOVEL FLUOROPOLYMER, RESIST COMPOSITIONS CONTAINING THE SAME, AND NOVEL FLUOROMONOMERS | Daikin Industries, Ltd. (JP) | 2004-08-25 | — | — | EP | disclosed |
| EP-1415974-A1 | PROCESS FOR PRODUCTION OF FLUORINE-CONTAINING NORBORNENE DERIVATIVES | Daikin Industries, Ltd. (JP) | 2004-05-06 | — | — | EP | disclosed |
| US-20030152864-A1 | Novel fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same | DAIKIN INDUSTRIES, LTD. | 2003-08-14 | — | — | US | disclosed |
| EP-1275666-A1 | NOVEL FLUOROPOLYMER HAVING ACID-REACTIVE GROUP AND CHEMICAL AMPLIFICATION TYPE PHOTORESIST COMPOSITION CONTAINING THE SAME | Daikin Industries, Ltd. (JP) | 2003-01-15 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11487204-B2 | Resist material | FLNA, AFF1, RXRA | ALDH1A1 2479/4885L3MBTL1 4344/4885KDM4E 2257/4885 |
| US-20180334523-A1 | NOVOLAC RESIN AND RESIST FILM | ASH2L, PRRC2C, ACSL1 | ALDH1A1 2624/4885L3MBTL1 935/4885KDM4E 724/4885 |
| US-20200166838-A1 | RESIST MATERIAL | FLNA, AFF1, RXRA | ALDH1A1 2479/4885L3MBTL1 4344/4885KDM4E 2257/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.