SCHEMBL3069660

SCHEMBL3069660

O=C(O)c1cc(CC2CO2)c(CC2CO2)c(C(=O)O)c1O

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HMGB1 P09429 2/20 0.36
CXCL12 P48061 2/20 0.36
ME2 P23368 1/20 0.35
ME1 P48163 1/20 0.35
ME3 Q16798 1/20 0.35
HPGD P15428 2/20 0.34
HSD17B10 Q99714 2/20 0.34
ALDH1A1 P00352 1/20 0.34
PTPN1 P18031 6/20 0.32
PTPN2 P17706 2/20 0.32
PTPN6 P29350 2/20 0.32
CYP2C9 P11712 1/20 0.32
TSHR P16473 1/20 0.32
ALOX12 P18054 1/20 0.32
ATIC P31939 1/20 0.32
POLB P06746 1/20 0.31
GPR35 Q9HC97 1/20 0.31
BCL2L1 Q07817 1/20 0.30
MCL1 Q07820 1/20 0.30
AKR1C4 P17516 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3076528 0.85 HMGB1 (0.33) HMGB1CXCL12ME2ME1ME3
SCHEMBL7727731 0.85 KDM4E (0.32)
SCHEMBL6689310 0.85 HMGB1 (0.31) HMGB1CXCL12ME2ME1ME3
SCHEMBL3076497 0.84 ALDH1A1 (0.30) HPGDHSD17B10ALDH1A1
SCHEMBL1644098 0.81
SCHEMBL1376717 0.81 HMGB1 (0.33) HMGB1CXCL12LDHALDHB
SCHEMBL1007226 0.81 LDHA (0.33) HMGB1CXCL12LDHALDHB
SCHEMBL11781831 0.81 ALDH1A1 (0.33) HPGDHSD17B10ALDH1A1
SCHEMBL3077721 0.81 HSD17B10 (0.36) HPGDHSD17B10ALDH1A1POLBGPR35
SCHEMBL3071307 0.79 FEN1 (0.32) LDHALDHB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122095316-A Composition for forming resist underlayer film 2026-05-26 CN disclosed
CN-114746468-B Method for producing polymer 日产化学株式会社 2024-09-13 CN disclosed
US-20230103242-A1 METHOD FOR PRODUCING POLYMER NISSAN CHEMICAL CORPORATION (JP) 2023-03-30 US disclosed
US-20230029997-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2023-02-02 US disclosed
WO-2021111977-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM 日産化学株式会社 2021-06-10 WO disclosed
WO-2021111976-A1 METHOD FOR PRODUCING POLYMER 日産化学株式会社 2021-06-10 WO disclosed
US-9240327-B2 Resist underlayer film-forming composition for EUV lithography containing condensation polymer NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-01-19 US disclosed
US-20140170567-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR EUV LITHOGRAPHY CONTAINING CONDENSATION POLYMER NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-06-19 US disclosed
EP-1757986-B1 ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER AND METHOD FOR FORMING PHOTORESIST PATTERN NISSAN CHEMICAL IND LTD (JP) 2014-05-14 EP disclosed
US-7790356-B2 Condensation type polymer-containing anti-reflective coating for semiconductor NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-09-07 US disclosed
US-20080038678-A1 Condensation Type Polymer-Containing Anti-Reflective Coating For Semiconductor NISSAN CHEMICAL INDUSTRIES LTD. (JP) 2008-02-14 US disclosed
EP-1757986-A1 ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER Nissan Chemical Industries, Ltd. (JP) 2007-02-28 EP disclosed