Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HMGB1 | P09429 | 2/20 | 0.33 |
| ▸ | CXCL12 | P48061 | 2/20 | 0.33 |
| ▸ | ME2 | P23368 | 1/20 | 0.32 |
| ▸ | ME1 | P48163 | 1/20 | 0.32 |
| ▸ | ME3 | Q16798 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | LDHA | P00338 | 1/20 | 0.30 |
| ▸ | LDHB | P07195 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7727731 | 0.88 | KDM4E (0.32) | — | |
| SCHEMBL3069660 | 0.85 | HMGB1 (0.36) | HMGB1CXCL12ME2ME1ME3 | |
| SCHEMBL3074823 | 0.84 | NOTUM (0.33) | HMGB1CXCL12MEN1KMT2ALDHA | |
| SCHEMBL1644711 | 0.84 | — | — | |
| SCHEMBL6689310 | 0.82 | HMGB1 (0.31) | HMGB1CXCL12ME2ME1ME3 | |
| SCHEMBL1644098 | 0.81 | — | — | |
| SCHEMBL1007226 | 0.81 | LDHA (0.33) | HMGB1CXCL12MEN1KMT2ALDHA | |
| SCHEMBL3076191 | 0.80 | PKM (0.32) | ALDH1A1 | |
| SCHEMBL3071307 | 0.79 | FEN1 (0.32) | LDHALDHB | |
| SCHEMBL1007227 | 0.79 | NOTUM (0.35) | HMGB1CXCL12ALDH1A1HPGDHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122095316-A | Composition for forming resist underlayer film | — | 2026-05-26 | — | — | CN | disclosed |
| WO-2025095106-A1 | RESIST UNDERLAYER FILM FORMATION COMPOSITION | 日産化学株式会社 | 2025-05-08 | — | — | WO | disclosed |
| CN-114746468-B | Method for producing polymer | 日产化学株式会社 | 2024-09-13 | — | — | CN | disclosed |
| US-20230103242-A1 | METHOD FOR PRODUCING POLYMER | NISSAN CHEMICAL CORPORATION (JP) | 2023-03-30 | — | — | US | disclosed |
| US-20230029997-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2023-02-02 | — | — | US | disclosed |
| WO-2021111976-A1 | METHOD FOR PRODUCING POLYMER | 日産化学株式会社 | 2021-06-10 | — | — | WO | disclosed |
| WO-2021111977-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2021-06-10 | — | — | WO | disclosed |
| US-9240327-B2 | Resist underlayer film-forming composition for EUV lithography containing condensation polymer | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-01-19 | — | — | US | disclosed |
| US-20140170567-A1 | RESIST UNDERLAYER FILM-FORMING COMPOSITION FOR EUV LITHOGRAPHY CONTAINING CONDENSATION POLYMER | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-06-19 | — | — | US | disclosed |
| EP-1757986-B1 | ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER AND METHOD FOR FORMING PHOTORESIST PATTERN | NISSAN CHEMICAL IND LTD (JP) | 2014-05-14 | — | — | EP | disclosed |
| US-7790356-B2 | Condensation type polymer-containing anti-reflective coating for semiconductor | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-09-07 | — | — | US | disclosed |
| US-20080038678-A1 | Condensation Type Polymer-Containing Anti-Reflective Coating For Semiconductor | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 2008-02-14 | — | — | US | disclosed |
| EP-1757986-A1 | ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER | Nissan Chemical Industries, Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |