SCHEMBL3075495

SCHEMBL3075495

CC1(C)C[N+]([O-])(c2ccccc2)CC1n1cccc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3089190 0.82
SCHEMBL3069555 0.67 DRD2 (0.38)
SCHEMBL5315848 0.57 DRD2 (0.32)
SCHEMBL22468064 0.56 SLC6A2 (0.32)
SCHEMBL11224081 0.56 LMNA (0.33)
SCHEMBL1828313 0.56 LMNA (0.33)
SCHEMBL28474350 0.56 OPRL1 (0.39)
SCHEMBL27946455 0.55 OPRM1 (0.30)
SCHEMBL76560 0.55 LMNA (0.32)
SCHEMBL22467911 0.54 ADRB2 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20140234760-A1 TRANSLUCENT ELECTROMAGNETIC SHIELD FILM, PRODUCING METHOD THEREFOR AND EMULSIFIER FUJIFILM CORPORATION (JP) 2014-08-21 US disclosed
US-7829270-B2 Photosensitive material, method of manufacturing conductive metal film, conductive metal film and light-transmitting film shielding electromagnetic wave for plasma display panel FUJIFILM CORPORATION (JP) 2010-11-09 US disclosed
US-7796327-B2 Light transmitting electromagnetic wave shielding film, optical filter and plasma display panel FUJIFILM CORPORATION (JP) 2010-09-14 US disclosed
US-20090133922-A1 LIGHT TRANSMITTING CONDUCTIVE FILM, LIGHT TRANSMITTING ELECTROMAGNETIC WAVE SHIELDING FILM, OPTICAL FILTER AND METHOD OF PRODUCING DISPLAY FILTER FUJIFILM CORPORATION (JP) 2009-05-28 US disclosed
US-20090052017-A1 LIGHT TRANSMITTING ELECTROMAGNETIC WAVE SHIELDING FILM, OPTICAL FILTER AND PLASMA DISPLAY PANEL FUJIFILM CORPORATION (JP) 2009-02-26 US disclosed
US-20090017277-A1 comprising a support; and an emulsion layer containing a silver salt emulsion, the photosensitive material being capable of forming a conductive metal film by exposing and developing the emulsion layer, wherein the emulsion layer has a swelling rate of 150% or more FUJIFILM CORPORATION (JP) 2009-01-15 US disclosed
EP-1863328-A1 LIGHT-TRANSMITTING ELECTROMAGNETIC SHIELDING FILM, OPTICAL FILTER AND PLASMA TELEVISION Fujifilm Corporation (JP) 2007-12-05 EP disclosed
EP-1850649-A1 LIGHT TRANSMITTING CONDUCTIVE FILM, LIGHT TRANSMITTING ELECTROMAGNETIC SHIELD FILM, OPTICAL FILTER AND METHOD FOR MANUFACTURING DISPLAY FILTER Fujifilm Corporation (JP) 2007-10-31 EP disclosed
WO-2006126739-A1 PHOTOSENSITIVE MATERIAL, METHOD OF MANUFACTURING CONDUCTIVE METAL FILM, CONDUCTIVE METAL FILM AND LIGHT-TRANSMITTING FILM SHIELDING ELECTROMAGNETIC WAVE FOR PLASMA DISPLAY PANEL FUJIFILM CORPORATION (JP) 2006-11-30 WO disclosed
US-20060008745-A1 Translucent electromagnetic shield film, producing method therefor and emulsifier FUJI PHOTO FILM CO., LTD. 2006-01-12 US disclosed