SCHEMBL30763518

SCHEMBL30763518

CCCCC(CC)Cc1cccc(O)c1

nearest known ligand 0.54

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 6/20 0.46
OPRD1 P41143 6/20 0.46
OPRK1 P41145 6/20 0.46
DRD2 P14416 5/20 0.46
DRD3 P35462 5/20 0.46
DRD1 P21728 1/20 0.44
DRD4 P21917 1/20 0.44
DRD5 P21918 1/20 0.44
ENPP2 Q13822 1/20 0.42
ALDH1A1 P00352 1/20 0.40
CA2 P00918 1/20 0.40
CHRM2 P08172 1/20 0.40
CHRM1 P11229 1/20 0.40
CHRM3 P20309 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28922215 1.00 OPRM1 (0.46) OPRM1OPRD1OPRK1DRD2DRD3
SCHEMBL27729902 0.85 OPRM1 (0.45) OPRM1OPRD1OPRK1DRD2DRD3
SCHEMBL19433117 0.83 PTGS2 (0.50) ALDH1A1CA2
SCHEMBL14402697 0.82 OPRM1 (0.47) OPRM1OPRD1OPRK1DRD2DRD3
SCHEMBL490504 0.81 ALDH1A1 (0.52) ALDH1A1CA2
SCHEMBL27175239 0.81 SIGMAR1 (0.48) OPRM1OPRD1OPRK1DRD2DRD3
SCHEMBL13821894 0.81 PNMT (0.53) OPRM1OPRD1OPRK1ALDH1A1CHRM2
SCHEMBL27175243 0.81 SIGMAR1 (0.48) OPRM1OPRD1OPRK1DRD2DRD3
SCHEMBL29411063 0.81 SIGMAR1 (0.48) OPRM1OPRD1OPRK1DRD2DRD3
SCHEMBL105942 0.80 ESR1 (0.51) ALDH1A1CA2CHRM2CHRM1CHRM3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120118458-A Curable composition, resin, and cured product 东京应化工业株式会社 2025-06-10 CN disclosed
CN-119937242-A Photosensitive resin composition 东京应化工业株式会社 2025-05-06 CN disclosed
CN-113337170-B Curable composition, cured product, near infrared absorbing filter, and method for producing same 东京应化工业株式会社 2024-04-05 CN disclosed
CN-117327362-A Curable resin composition 东京应化工业株式会社 2024-01-02 CN disclosed
CN-117215149-A Photosensitive resin composition 东京应化工业株式会社 2023-12-12 CN disclosed