Alcohol

Alcohol

SCHEMBL3093695

C1COC(COCC2CO2)C1.CCO

nearest known ligand 0.48

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

MMP1MMP13MMP7MMP8polrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Alcohol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 4/20 0.48
ALDH1A1 P00352 4/20 0.46
TDP1 Q9NUW8 1/20 0.46
TSHR P16473 2/20 0.45
LMNA P02545 3/20 0.45
POLB P06746 1/20 0.45
MAPK1 P28482 1/20 0.41
PDK1 Q15118 2/20 0.38
TP53 P04637 1/20 0.37
CYP3A4 P08684 1/20 0.37
HPGD P15428 1/20 0.37
NPC1 O15118 2/20 0.36
RAB9A P51151 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Alcohol SCHEMBL7527792 0.94 LMNA (0.49) SMN1; SMN2ALDH1A1TDP1LMNAPOLB
SCHEMBL594011 0.90 TSHR (0.54) SMN1; SMN2ALDH1A1TDP1TSHRLMNA
SCHEMBL3093708 0.87 TSHR (0.47) SMN1; SMN2ALDH1A1TDP1TSHRLMNA
Ethylene Glycol SCHEMBL11791402 0.84 LMNA (0.50) SMN1; SMN2ALDH1A1TSHRLMNAPOLB
Alcohol SCHEMBL150777 0.84 SMN1; SMN2 (0.58) SMN1; SMN2ALDH1A1TDP1TSHRMAPK1
SCHEMBL812840 0.84 LMNA (0.52) SMN1; SMN2ALDH1A1TSHRLMNAPOLB
Alcohol SCHEMBL20394646 0.82 SMN1; SMN2 (0.59) SMN1; SMN2ALDH1A1TDP1TSHRLMNA
SCHEMBL16345225 0.82 LMNA (0.50) SMN1; SMN2ALDH1A1TSHRLMNAPOLB
Barium SCHEMBL2592652 0.82 LMNA (0.50) SMN1; SMN2ALDH1A1TSHRLMNAPOLB
SCHEMBL3757540 0.82 LMNA (0.50) SMN1; SMN2ALDH1A1TSHRLMNAPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116987233-A Cationic UV (ultraviolet) heat curing composition and preparation method thereof 上海汉司实业有限公司 2023-11-03 CN claimed
CN-110582540-B Photocurable epoxy composition 汉高股份有限及两合公司 2022-11-22 CN claimed
CN-110582540-A Photocurable epoxy composition 汉高股份有限及两合公司 2019-12-17 CN claimed
WO-2018184151-A1 Light cure epoxy composition HENKEL AG & CO. KGAA (DE) 2018-10-11 WO claimed
CN-116987233-A Cationic UV (ultraviolet) heat curing composition and preparation method thereof 上海汉司实业有限公司 2023-11-03 CN disclosed
CN-110582540-B Photocurable epoxy composition 汉高股份有限及两合公司 2022-11-22 CN disclosed
CN-110582540-A Photocurable epoxy composition 汉高股份有限及两合公司 2019-12-17 CN disclosed
WO-2018184151-A1 Light cure epoxy composition HENKEL AG & CO. KGAA (DE) 2018-10-11 WO disclosed
EP-2640765-B1 ONE COMPONENT EPOXY RESIN COMPOSITION Henkel IP & Holding GmbH (DE) 2017-01-04 EP disclosed
CN-103333329-B Method for preparing polycarbonate by copolymerizing carbon dioxide and alpha-pinene derivatives UNIV KUNMING SCIENCE & TECHNOLOGY 2015-06-03 CN disclosed
EP-2867270-A1 WATER-BASED EPOXY RESIN EMULSION Henkel AG & Co. KGaA (DE) 2015-05-06 EP disclosed
WO-2014104380-A1 AQUEOUS AMINE EMULSION HENKEL AG & CO. KGAA (DE) 2014-07-03 WO disclosed
WO-2012067270-A1 ONE COMPONENT EPOXY RESIN COMPOSITION HENKEL JAPAN LTD. (JP) 2012-05-24 WO disclosed
US-7795744-B2 Cationically curable epoxy resin composition HENKEL CORPORATION (US) 2010-09-14 US disclosed
CN-101676315-A Sealant for liquid crystal instillation technique and method for manufacturing liquid crystal dispaly HENKEL CORP 2010-03-24 CN disclosed
US-7456230-B2 Cationically photocurable epoxy resin compositions HENKEL CORPORATION (US) 2008-11-25 US disclosed
US-20070208106-A1 Cationically Curable Epoxy Resin Composition Henkel IP & Holding GmbH (DE) 2007-09-06 US disclosed
CN-1288207-C Photocationic curable epoxy resin composition HENKEL LOCTITE CORP (US) 2006-12-06 CN disclosed
US-20050245643-A1 Photo-induced cation curable epoxy resin composition Henkel IP & Holding GmbH (DE) 2005-11-03 US disclosed
CN-1665881-A Photocationic curable epoxy resin composition HENKEL LOCTITE CORP (US) 2005-09-07 CN disclosed