Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.50 |
| ▸ | POLB | P06746 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.47 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | PRMT5 | O14744 | 1/20 | 0.38 |
| ▸ | WDR77 | Q9BQA1 | 1/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.37 |
| ▸ | USP2 | O75604 | 1/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | DRD2 | P14416 | 1/20 | 0.35 |
| ▸ | HTR2A | P28223 | 1/20 | 0.35 |
| ▸ | HRH1 | P35367 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL812840 | 0.97 | LMNA (0.52) | LMNAPOLBALDH1A1TSHRPRMT5 | |
| Barium SCHEMBL2592652 | 0.95 | LMNA (0.50) | LMNAPOLBALDH1A1TSHRPRMT5 | |
| SCHEMBL16345225 | 0.95 | LMNA (0.50) | LMNAPOLBALDH1A1TSHRPRMT5 | |
| SCHEMBL594011 | 0.91 | TSHR (0.54) | LMNAPOLBALDH1A1TSHRPRMT5 | |
| SCHEMBL6975491 | 0.90 | TSHR (0.46) | LMNAPOLBALDH1A1TSHRSMN1; SMN2 | |
| Ethylene Glycol SCHEMBL11791402 | 0.89 | LMNA (0.50) | LMNAPOLBALDH1A1TSHRPRMT5 | |
| SCHEMBL329342 | 0.88 | LMNA (0.48) | LMNAPOLBALDH1A1TSHRPRMT5 | |
| Alcohol SCHEMBL7527792 | 0.87 | LMNA (0.49) | LMNAPOLBALDH1A1PRMT5WDR77 | |
| SCHEMBL8210573 | 0.86 | TSHR (0.48) | LMNAPOLBALDH1A1TSHRPRMT5 | |
| Propene SCHEMBL7922596 | 0.85 | LMNA (0.43) | LMNAPOLBALDH1A1TSHRPRMT5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1841603-B1 | Method for preparing a tire having improved silica reinforcement | BRIDGESTONE CORP (JP) | 2009-11-25 | — | — | EP | claimed |
| US-20240019782-A1 | Composition For Forming Metal Oxide Film, Patterning Process, And Method For Forming Metal Oxide Film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-18 | — | — | US | disclosed |
| EP-4303657-A2 | COMPOSITION FOR FORMING METAL OXIDE FILM, PATTERNING PROCESS, AND METHOD FOR FORMING METAL OXIDE FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-10 | — | — | EP | disclosed |
| CN-110515266-B | Pattern forming method | 信越化学工业株式会社 | 2023-06-23 | — | — | CN | disclosed |
| CN-110515272-B | Pattern forming method | 信越化学工业株式会社 | 2023-06-23 | — | — | CN | disclosed |
| US-11614686-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-03-28 | — | — | US | disclosed |
| US-11366386-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-06-21 | — | — | US | disclosed |
| US-11231649-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-01-25 | — | — | US | disclosed |
| EP-3572880-B1 | PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2021-05-12 | — | — | EP | disclosed |
| EP-3572878-B1 | PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2020-12-30 | — | — | EP | disclosed |
| US-20190258160-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-08-22 | — | — | US | disclosed |
| US-9748097-B2 | Coating liquid for forming metal oxide film, metal oxide film, field-effect transistor, and method for producing field-effect transistor | RICOH COMPANY, LTD. (JP) | 2017-08-29 | — | — | US | disclosed |
| US-20160042947-A1 | COATING LIQUID FOR FORMING METAL OXIDE FILM, METAL OXIDE FILM, FIELD-EFFECT TRANSISTOR, AND METHOD FOR PRODUCING FIELD-EFFECT TRANSISTOR | RICOH COMPANY, LTD. (JP) | 2016-02-11 | — | — | US | disclosed |
| EP-2962327-A1 | COATING LIQUID FOR FORMING METAL OXIDE FILM, METAL OXIDE FILM, FIELD-EFFECT TRANSISTOR, AND METHOD FOR PRODUCING FIELD-EFFECT TRANSISTOR | Ricoh Company, Ltd. (JP) | 2016-01-06 | — | — | EP | disclosed |
| WO-2014157733-A1 | COATING LIQUID FOR FORMING METAL OXIDE FILM, METAL OXIDE FILM, FIELD-EFFECT TRANSISTOR, AND METHOD FOR PRODUCING FIELD-EFFECT TRANSISTOR | RICOH COMPANY, LTD. (JP) | 2014-10-02 | — | — | WO | disclosed |
| US-7837976-B2 | Activated aluminum hydride hydrogen storage compositions and uses thereof | BROOKHAVEN SCIENCE ASSOCIATES, LLC (US) | 2010-11-23 | — | — | US | disclosed |
| EP-1798599-B1 | Antireflection film composition, patterning process and substrate using the same | SHINETSU CHEMICAL CO (JP) | 2008-08-06 | — | — | EP | disclosed |
| EP-1798599-A1 | Antireflection film composition, patterning process and substrate using the same | Shinetsu Chemical Co., Ltd. (JP) | 2007-06-20 | — | — | EP | disclosed |
| US-20070134916-A1 | Antireflection film composition, patterning process and substrate using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-06-14 | — | — | US | disclosed |
| US-20070025908-A1 | Activated aluminum hydride hydrogen storage compositions and uses thereof | ENERGY, UNITED STATES DEPARTMENT OF | 2007-02-01 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11366386-B2 | Patterning process | FEM1B, EGLN1, TET1 | LMNA 1391/4885POLB 1349/4885ALDH1A1 960/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.