SCHEMBL3119986

SCHEMBL3119986

O=COCc1cccc(Cl)c1[N+](=O)[O-]

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSP90AA1 P07900 1/20 0.37
MAPT P10636 1/20 0.36
MAPK1 P28482 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
IDO1 P14902 3/20 0.35
TDO2 P48775 1/20 0.35
GRIN2D O15399 1/20 0.35
GRIN3B O60391 1/20 0.35
GRIN1 Q05586 1/20 0.35
GRIN2A Q12879 1/20 0.35
GRIN2B Q13224 1/20 0.35
GRIN2C Q14957 1/20 0.35
GRIN3A Q8TCU5 1/20 0.35
TLR8 Q9NR97 1/20 0.34
ALDH1A1 P00352 5/20 0.34
TSHR P16473 3/20 0.34
TDP1 Q9NUW8 1/20 0.34
HPGD P15428 1/20 0.34
SMN1; SMN2 Q16637 2/20 0.34
NPC1 O15118 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3117929 0.81 ALDH1A1 (0.55) MAPTMAPK1ALDH1A1TSHRTDP1
SCHEMBL7107938 0.81 ALDH1A1 (0.40) MAPTMAPK1L3MBTL1IDO1TDO2
SCHEMBL22394589 0.79 HSP90AA1 (0.40) HSP90AA1MAPTMAPK1L3MBTL1IDO1
SCHEMBL3126188 0.77 MMP1 (0.42) MAPTMAPK1L3MBTL1IDO1TDO2
SCHEMBL5539552 0.76 IDO1 (0.58) IDO1ALDH1A1TDP1SMN1; SMN2CYP3A4
SCHEMBL14228218 0.76 ALDH1A1 (0.45) HSP90AA1MAPTMAPK1L3MBTL1IDO1
SCHEMBL69094 0.76 TSHR (0.53) HSP90AA1MAPTMAPK1L3MBTL1IDO1
SCHEMBL28944504 0.76 MMP1 (0.41) MAPTMAPK1ALDH1A1TDP1SMN1; SMN2
SCHEMBL98918 0.76 IDO1 (0.55) L3MBTL1IDO1HPGDNPC1RAB9A
SCHEMBL4146537 0.75 PNMT (0.53) HSP90AA1MAPTMAPK1L3MBTL1IDO1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7651834-B2 Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device production CANON KABUSHIKI KAISHA (JP) 2010-01-26 US disclosed
US-20070287105-A1 PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, METHOD FOR RESIST PATTERN FORMATION, AND PROCESS FOR DEVICE PRODUCTION CANON KABUSHIKI KAISHA (JP) 2007-12-13 US disclosed
EP-1865379-A1 Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device prodution Canon Kabushiki Kaisha (JP) 2007-12-12 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070287105-A1 PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, METHOD FOR RESIST PATTERN FORMATION, AND PROCESS FOR DEVICE PRODUCTION RER1, C1R, CRY2 HSP90AA1 4411/4885MAPT 2153/4885MAPK1 576/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.