SCHEMBL3129078

SCHEMBL3129078

O=S(=O)(O)c1cc(F)c(F)c(F)c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LCK P06239 1/20 0.44
FYN P06241 1/20 0.44
CES2 O00748 3/20 0.44
CES1 P23141 3/20 0.44
ING2 Q9H160 1/20 0.43
CA1 P00915 6/20 0.41
CA2 P00918 6/20 0.41
CA12 O43570 2/20 0.41
CA7 P43166 2/20 0.41
CA13 Q8N1Q1 1/20 0.41
TSHR P16473 3/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
LMNA P02545 1/20 0.39
ALDH1A1 P00352 4/20 0.37
NT5E P21589 2/20 0.37
HSD17B10 Q99714 3/20 0.37
TDP1 Q9NUW8 1/20 0.37
CA4 P22748 3/20 0.36
CA9 Q16790 3/20 0.35
CA6 P23280 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL27862607 0.97 LCK (0.43) LCKFYNCES2CES1ING2
SCHEMBL28056754 0.80 CA1 (0.50) LCKFYNING2CA1CA2
SCHEMBL22396634 0.80 HDAC1 (0.42) LCKFYNING2CA1CA2
SCHEMBL5126356 0.79 LCK (0.44) LCKFYNING2TSHRSMN1; SMN2
Hydrochloric Acid SCHEMBL28104419 0.78 LCK (0.40) LCKFYNING2CA1CA2
SCHEMBL29196115 0.78 GAA (0.56) CA1CA2CA12SMN1; SMN2LMNA
SCHEMBL30741188 0.78 GAA (0.56) CA1CA2CA12SMN1; SMN2LMNA
SCHEMBL5151223 0.78 CA1 (0.44) CES2CES1CA1CA2CA12
SCHEMBL219222 0.76 LCK (0.57) LCKFYNING2CA1CA2
SCHEMBL795577 0.76 LCK (0.46) LCKFYNCES2CES1ING2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119528810-B Quinoline compound and application thereof 山东第一医科大学(山东省医学科学院) 2025-04-29 CN disclosed
CN-119528810-A Quinoline compound and application thereof 山东第一医科大学(山东省医学科学院) 2025-02-28 CN disclosed
US-20250020997-A1 PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2025-01-16 US disclosed
US-20230176481-A1 FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-06-08 US disclosed
EP-1676835-B1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT WAKO PURE CHEM IND LTD (JP) 2014-12-10 EP disclosed
US-8669375-B2 Process for producing ester compound WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2014-03-11 US disclosed
US-20130066070-A1 PROCESS FOR PRODUCING ESTER COMPOUND WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2013-03-14 US disclosed
US-8318964-B2 Process for producing ester compound WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2012-11-27 US disclosed
US-20100324314-A1 PROCESS FOR PRODUCING ESTER COMPOUND WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-12-23 US disclosed
US-7833691-B2 Heterocycle-bearing onium salts WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-11-16 US disclosed
CN-1678574-A Process for producing aminoalkylsulfonic acid and method of salt exchange for salt thereof WAKO PURE CHEM IND LTD (JP) 2005-10-05 CN disclosed
EP-1548002-A1 PROCESS FOR PRODUCING AMINOALKYLSULFONIC ACID AND METHOD OF SALT EXCHANGE FOR SALT THEREOF Wako Pure Chemical Industries, Ltd. (JP) 2005-06-29 EP disclosed
CN-1622943-A Heterocyclic onium salt WAKO PURE CHEM IND LTD (JP) 2005-06-01 CN disclosed
CN-1578766-A Hybrid onium salt WAKO PURE CHEM IND LTD (JP) 2005-02-09 CN disclosed
US-20050020710-A1 Hybrid onium salt WAKO PURE CHEMICALS INDUSTRIES, LTD. (JP) 2005-01-27 US disclosed
EP-1481973-A1 HETEROCYCLE-BEARING ONIUM SALTS Wako Pure Chemical Industries, Ltd. (JP) 2004-12-01 EP disclosed
EP-1443042-A1 HYBRID ONIUM SALT Wako Pure Chemical Industries, Ltd. (JP) 2004-08-04 EP disclosed
US-20030235779-A1 Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-12-25 US disclosed
US-20030207201-A1 Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-11-06 US disclosed
US-20030113659-A1 Resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-06-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130066070-A1 PROCESS FOR PRODUCING ESTER COMPOUND ADH1C, ADH5, ADH1A LCK 2517/4885FYN 1656/4885CES2 185/4885
US-20030207201-A1 Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method ASIC1, PARG, EEF1A2 LCK 4187/4885FYN 2320/4885CES2 3936/4885
US-20100324314-A1 PROCESS FOR PRODUCING ESTER COMPOUND ADH1C, ADH5, ADH1A LCK 3023/4885FYN 2098/4885CES2 121/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.