Sugi Predict

Sugi Predict / Compounds / SCHEMBL795577

SCHEMBL795577

SCHEMBL795577

O=S(=O)(O)c1cc(F)cc(F)c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LCK P06239 1/20 0.46
▸ FYN P06241 1/20 0.46
▸ ING2 Q9H160 1/20 0.44
▸ TSHR P16473 3/20 0.42
▸ CES2 O00748 2/20 0.42
▸ CES1 P23141 2/20 0.42
▸ SMN1; SMN2 Q16637 1/20 0.42
▸ CA1 P00915 2/20 0.41
▸ CA12 O43570 1/20 0.41
▸ CA9 Q16790 1/20 0.41
▸ LMNA P02545 1/20 0.40
▸ ALDH1A1 P00352 4/20 0.39
▸ NT5E P21589 2/20 0.39
▸ HSD17B10 Q99714 3/20 0.38
▸ TDP1 Q9NUW8 2/20 0.38
▸ PKM P14618 1/20 0.38
▸ KMT2A Q03164 1/20 0.38
▸ PARP1 P09874 1/20 0.37
▸ CASP6 P55212 2/20 0.36
▸ SOS1 Q07889 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL28011464 0.97 LCK (0.44) LCKFYNING2TSHRCES2
SCHEMBL17262652 0.85 CA12 (0.52) LCKFYNING2TSHRSMN1; SMN2
SCHEMBL18373565 0.84 LCK (0.39) LCKFYNING2TSHRCES2
SCHEMBL17262656 0.84 ALDH1A1 (0.50) LCKFYNING2TSHRSMN1; SMN2
SCHEMBL3182026 0.80 CES2 (0.42) LCKFYNING2CES2CA1
SCHEMBL219222 0.78 LCK (0.57) LCKFYNING2TSHRSMN1; SMN2
SCHEMBL778133 0.77 CES2 (0.39) CES2CES1CA1CA12CA9
SCHEMBL20080938 0.76 TRPV1 (0.44) LCKFYNING2LMNAALDH1A1
SCHEMBL5126356 0.76 LCK (0.44) LCKFYNING2TSHRSMN1; SMN2
SCHEMBL3129078 0.76 LCK (0.44) LCKFYNING2TSHRCES2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11718758-B2 Aqueous dispersion of colored particles MITSUBISHI PENCIL COMPANY, LIMITED (JP) 2023-08-08 — — US disclosed
EP-3725854-B1 COLORED PARTICLE AQUEOUS DISPERSION MITSUBISHI PENCIL CO (JP) 2023-07-05 — — EP disclosed
WO-2021241484-A1 WRITING IMPLEMENT 三菱鉛筆株式会社 2021-12-02 — — WO disclosed
US-10913855-B2 Silicon-containing heterocyclic compound, and quencher FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2021-02-09 — — US disclosed
EP-3725854-A1 COLORED PARTICLE AQUEOUS DISPERSION MITSUBISHI PENCIL COMPANY, LIMITED (JP) 2020-10-21 — — EP disclosed
US-10450462-B2 Colored composition FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-10-22 — — US disclosed
US-10377713-B2 Quencher FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-08-13 — — US disclosed
US-20190233651-A1 SILICON-CONTAINING HETEROCYCLIC COMPOUND, AND QUENCHER FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-08-01 — — US disclosed
US-10253118-B2 Cyanine coloring composition FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-04-09 — — US disclosed
EP-3150643-B1 TRIPHENYLMETHANE-BASED COLORED COMPOSITION WAKO PURE CHEM IND LTD (JP) 2017-12-27 — — EP disclosed
US-20060141383-A1 Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions JSR CORPORATION (JP) 2006-06-29 — — US disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 — — US disclosed
CN-1738813-A Sulfonium salt compound, radiation-sensitive acid generator, and positive-type radiation-sensitive resin composition JSR CORP (JP) 2006-02-22 — — CN disclosed
EP-1586570-A1 SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS JSR Corporation (JP) 2005-10-19 — — EP disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 — — US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 — — US disclosed
US-20030235779-A1 Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-12-25 — — US disclosed
US-20030207201-A1 Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-11-06 — — US disclosed
US-20030113659-A1 Resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-06-19 — — US disclosed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10450462-B2 Colored composition IK, HEATR6, CYBA LCK 1553/4885FYN 1563/4885ING2 2834/4885
US-10377713-B2 Quencher AHR, GFER, AKR1A1 LCK 4140/4885FYN 3577/4885ING2 681/4885
US-20030207201-A1 Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method ASIC1, PARG, EEF1A2 LCK 4187/4885FYN 2320/4885ING2 670/4885
US-10253118-B2 Cyanine coloring composition ABCC1, IK, KATNAL2 LCK 2143/4885FYN 398/4885ING2 1718/4885
US-10913855-B2 Silicon-containing heterocyclic compound, and quencher ANXA11, ANXA1, ORAI2 LCK 3747/4885FYN 3105/4885ING2 431/4885
US-20190233651-A1 SILICON-CONTAINING HETEROCYCLIC COMPOUND, AND QUENCHER ANXA11, ANXA1, ORAI2 LCK 3680/4885FYN 3068/4885ING2 456/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.