SCHEMBL3130055

SCHEMBL3130055

CC(C)(C)Oc1ccc(S(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 11/20 0.39
CA2 P00918 11/20 0.39
HSD11B1 P28845 2/20 0.38
ABCC9 O60706 1/20 0.34
ABCC8 Q09428 1/20 0.34
KCNJ11 Q14654 1/20 0.34
KCNJ8 Q15842 1/20 0.34
MEN1 O00255 1/20 0.34
CYP1A2 P05177 1/20 0.34
CYP3A4 P08684 1/20 0.34
CYP2D6 P10635 1/20 0.34
TSHR P16473 1/20 0.34
CYP2C19 P33261 1/20 0.34
KMT2A Q03164 1/20 0.34
NR1H2 P55055 1/20 0.33
PPARA Q07869 1/20 0.33
JAK2 O60674 1/20 0.32
JAK3 P52333 1/20 0.32
PTK2 Q05397 1/20 0.32
RORC P51449 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1804153 1.00 CA1 (0.39) CA1CA2HSD11B1ABCC9ABCC8
SCHEMBL548226 0.99 HSD11B1 (0.39) CA1CA2HSD11B1ABCC9ABCC8
SCHEMBL2914111 0.87 HSD11B1 (0.43) CA1CA2HSD11B1MEN1KMT2A
SCHEMBL3132698 0.87 HSD11B1 (0.43) CA1CA2HSD11B1MEN1KMT2A
SCHEMBL3132264 0.87 HSD11B1 (0.43) CA1CA2HSD11B1MEN1KMT2A
SCHEMBL3144470 0.87 HSD11B1 (0.43) CA1CA2HSD11B1MEN1KMT2A
SCHEMBL60438 0.87 CA2 (0.44) CA1CA2HSD11B1NR1H2
SCHEMBL4535203 0.87 CA2 (0.44) CA1CA2HSD11B1NR1H2
SCHEMBL60138 0.87 CA2 (0.44) CA1CA2HSD11B1NR1H2
SCHEMBL965542 0.87 CA2 (0.44) CA1CA2HSD11B1NR1H2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1676835-B1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT WAKO PURE CHEM IND LTD (JP) 2014-12-10 EP disclosed
US-7642368-B2 for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-05 US disclosed
EP-1676835-A1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT Wako Pure Chemical Industries, Ltd. (JP) 2006-07-05 EP disclosed