Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 11/20 | 0.39 |
| ▸ | CA2 | P00918 | 11/20 | 0.39 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.38 |
| ▸ | ABCC9 | O60706 | 1/20 | 0.34 |
| ▸ | ABCC8 | Q09428 | 1/20 | 0.34 |
| ▸ | KCNJ11 | Q14654 | 1/20 | 0.34 |
| ▸ | KCNJ8 | Q15842 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.33 |
| ▸ | PPARA | Q07869 | 1/20 | 0.33 |
| ▸ | JAK2 | O60674 | 1/20 | 0.32 |
| ▸ | JAK3 | P52333 | 1/20 | 0.32 |
| ▸ | PTK2 | Q05397 | 1/20 | 0.32 |
| ▸ | RORC | P51449 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3130055 | 1.00 | CA1 (0.39) | CA1CA2HSD11B1ABCC9ABCC8 | |
| SCHEMBL548226 | 0.99 | HSD11B1 (0.39) | CA1CA2HSD11B1ABCC9ABCC8 | |
| SCHEMBL2914111 | 0.87 | HSD11B1 (0.43) | CA1CA2HSD11B1MEN1KMT2A | |
| SCHEMBL3132698 | 0.87 | HSD11B1 (0.43) | CA1CA2HSD11B1MEN1KMT2A | |
| SCHEMBL3132264 | 0.87 | HSD11B1 (0.43) | CA1CA2HSD11B1MEN1KMT2A | |
| SCHEMBL3144470 | 0.87 | HSD11B1 (0.43) | CA1CA2HSD11B1MEN1KMT2A | |
| SCHEMBL60438 | 0.87 | CA2 (0.44) | CA1CA2HSD11B1NR1H2 | |
| SCHEMBL4535203 | 0.87 | CA2 (0.44) | CA1CA2HSD11B1NR1H2 | |
| SCHEMBL60138 | 0.87 | CA2 (0.44) | CA1CA2HSD11B1NR1H2 | |
| SCHEMBL965542 | 0.87 | CA2 (0.44) | CA1CA2HSD11B1NR1H2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1676835-B1 | PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT | WAKO PURE CHEM IND LTD (JP) | 2014-12-10 | — | — | EP | disclosed |
| US-8771923-B2 | Radiation-sensitive composition | JSR CORPORATION (JP) | 2014-07-08 | — | — | US | disclosed |
| US-20130108962-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2013-05-02 | — | — | US | disclosed |
| US-8389202-B2 | Polymer, radiation-sensitive composition, monomer, and method of producing compound | JSR CORPORATION (JP) | 2013-03-05 | — | — | US | disclosed |
| US-8377627-B2 | Compound and radiation-sensitive composition | JSR CORPORATION (JP) | 2013-02-19 | — | — | US | disclosed |
| US-8361691-B2 | Radiation-sensitive composition and process for producing low-molecular compound for use therein | JSR CORPORATION (JP) | 2013-01-29 | — | — | US | disclosed |
| US-20120178024-A1 | POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND | JSR CORPORATION (JP) | 2012-07-12 | — | — | US | disclosed |
| US-8173351-B2 | Compound and radiation-sensitive composition | JSR CORPORATION (JP) | 2012-05-08 | — | — | US | disclosed |
| US-7977442-B2 | Radiation-sensitive composition, polymer and monomer | JSR CORPORATION (JP) | 2011-07-12 | — | — | US | disclosed |
| US-20110117489-A1 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2011-05-19 | — | — | US | disclosed |
| EP-1482361-B1 | ACID-DEGRADABLE RESIN COMPOSITIONS CONTAINING KETENE-ALDEHYDE COPOLYMER | NIPPON SODA CO (JP) | 2007-10-03 | — | — | EP | disclosed |
| US-20070083060-A1 | for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2007-04-12 | — | — | US | disclosed |
| EP-1720063-A1 | Resin containing ketene-aldehyde copolymer | NIPPON SODA CO., LTD. (JP) | 2006-11-08 | — | — | EP | disclosed |
| US-7105272-B2 | Acid-degradable resin compositions containing ketene-aldehyde copolymer | NIPPON SODA CO., LTD. (JP) | 2006-09-12 | — | — | US | disclosed |
| EP-1676835-A1 | PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT | Wako Pure Chemical Industries, Ltd. (JP) | 2006-07-05 | — | — | EP | disclosed |
| US-20060078821-A1 | A caroboxyalkylanthracene based compound, a hydroxy or alkoxystyrene polymer, and a sulfonimide compound as photoacid generator; low sublimation properties and excellent compatibility with other components; exhibits optimum controllability of radiation transmittance; microfabrication | JSR CORPORATION (JP) | 2006-04-13 | — | — | US | disclosed |
| EP-1640804-A2 | Positive-tone radiation-sensitive resin composition | JSR Corporation (JP) | 2006-03-29 | — | — | EP | disclosed |
| US-20050130057-A1 | Acid-degradable resin compositions containing ketene-aldehyde copolymer | NIPPON SODA CO., LTD. (JP) | 2005-06-16 | — | — | US | disclosed |
| EP-1482361-A1 | ACID-DEGRADABLE RESIN COMPOSITIONS CONTAINING KETENE-ALDEHYDE COPOLYMER | NIPPON SODA CO., LTD. (JP) | 2004-12-01 | — | — | EP | disclosed |
| US-20030022095-A1 | Negative type radiation sensitive resin composition | JSR CORPORATION (JP) | 2003-01-30 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070083060-A1 | for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid | ARSA, HAO2, HAO1 | CA1 96/4885CA2 38/4885HSD11B1 718/4885 |
| US-20110117489-A1 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION | ERCC2, RAD51, ATM | CA1 2469/4885CA2 4758/4885HSD11B1 1031/4885 |
| US-20120178024-A1 | POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND | RAD51, PYM1, MRE11 | CA1 1065/4885CA2 2553/4885HSD11B1 1551/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.