SCHEMBL313050

SCHEMBL313050

CNC(=O)c1ccc2cc(C(O)c3cn(C(c4ccccc4)(c4ccccc4)c4ccccc4)cn3)ccc2c1

nearest known ligand 0.42

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ACSS2 Q9NR19 6/20 0.42
CYP17A1 P05093 4/20 0.39
CYP3A4 P08684 4/20 0.39
PLK1 P53350 1/20 0.37
SIRT2 Q8IXJ6 5/20 0.37
PLAU P00749 1/20 0.37
BRD4 O60885 3/20 0.36
TAF1 P21675 1/20 0.35
BRD2 P25440 1/20 0.35
BRD3 Q15059 1/20 0.35
BRDT Q58F21 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1737415 0.84 KDM4E (0.40) SIRT2
SCHEMBL4025341 0.83 SIRT2 (0.47) ACSS2CYP17A1CYP3A4PLK1SIRT2
SCHEMBL4033379 0.81 HDAC1 (0.43) ACSS2CYP17A1CYP3A4SIRT2
SCHEMBL17561949 0.81 PLAU (0.43) CYP17A1CYP3A4PLK1PLAUBRD4
SCHEMBL4031518 0.81 PIN1 (0.37) ACSS2CYP17A1CYP3A4PLK1SIRT2
SCHEMBL313125 0.80 ACSS2 (0.43) ACSS2CYP17A1CYP3A4PLK1SIRT2
SCHEMBL5682208 0.80 AKR1C3 (0.40) ACSS2SIRT2
SCHEMBL20306729 0.80 PLAU (0.42) CYP17A1CYP3A4PLK1PLAUBRD4
SCHEMBL14248358 0.79 TNFSF11 (0.38) CYP17A1CYP3A4PLK1PLAUBRD4
SCHEMBL5678248 0.78 AKR1C3 (0.44) ACSS2CYP17A1SIRT2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10005780-B2 Production method of imidazole derivatives TAKEDA PHARMACEUTICAL COMPANY (JP) 2018-06-26 US disclosed
US-20160244454-A1 PRODUCTION METHOD OF IMIDAZOLE DERIVATIVES TAKEDA PHARMACEUTICALS CO (JP) 2016-08-25 US disclosed
US-9278938-B2 Production method of imidazole derivatives TAKEDA PHARMACEUTICAL COMPANY LIMITED (JP) 2016-03-08 US disclosed
EP-2721010-B1 PRODUCTION METHOD OF IMIDAZOLE DERIVATIVES TAKEDA PHARMACEUTICAL (JP) 2015-09-09 EP disclosed
EP-2721010-A1 PRODUCTION METHOD OF IMIDAZOLE DERIVATIVES Takeda Pharmaceutical Company Limited (JP) 2014-04-23 EP disclosed
US-20140100373-A1 PRODUCTION METHOD OF IMIDAZOLE DERIVATIVES TAKEDA PHARMACEUTICAL COMPANY LIMITED (JP) 2014-04-10 US disclosed
US-8586762-B2 Process for producing fused imidazole compound, reformatsky reagent in stable form, and process for producing the same TAKEDA PHARMACEUTICAL COMPANY LIMITED (JP) 2013-11-19 US disclosed
WO-2012173280-A1 PRODUCTION METHOD OF IMIDAZOLE DERIVATIVES TAKEDA PHARMACEUTICAL COMPANY LIMITED (JP) 2012-12-20 WO disclosed
EP-1471056-B1 PROCESS FOR PRODUCING FUSED IMIDAZOLE COMPOUND, REFORMATSKY REAGENT IN STABLE FORM, AND PROCESS FOR PRODUCING THE SAME TAKEDA PHARMACEUTICAL (JP) 2012-07-11 EP disclosed
US-20120077985-A1 PROCESS FOR PRODUCING FUSED IMIDAZOLE COMPOUND, REFORMATSKY REAGENT IN STABLE FORM, AND PROCESS FOR PRODUCING THE SAME TAKEDA PHARMACEUTICAL COMPANY LIMITED (JP) 2012-03-29 US disclosed
US-8093403-B2 Process for producing fused imidazole compound, reformatsky reagent in stable form, and process for producing the same TAKEDA PHARMACEUTICAL COMPANY LIMITED (JP) 2012-01-10 US disclosed
EP-2275411-A2 Reformatsky Reagent in Stable Form and Process for Producing the Same Takeda Pharmaceutical Company Limited (JP) 2011-01-19 EP disclosed
US-20100105922-A1 PROCESS FOR PRODUCING FUSED IMIDAZOLE COMPOUND, REFORMATSKY REAGENT IN STABLE FORM, AND PROCESS FOR PRODUCING THE SAME TAKEDA PHARMACEUTICAL COMPANY LIMITED (JP) 2010-04-29 US disclosed
US-7662974-B2 reduction of carboxylic acid ester using metal hydride complexes and metal halides to form compounds such as ethyl (3S)-3-hydroxy-3-{6-[(methylamino)carbonyl]-2-naphthyl}-3-(1-trityl-1H-imidazol-4-yl)propanoate, used as lyase enzyme inhibitors TAKEDA PHARMACEUTICAL COMPANY LIMITED (JP) 2010-02-16 US disclosed
US-20050043544-A1 Process for producing fused imidazole compound, reformatsky reagent in stable form, and process for producing the same TAKEDA PHARMACEUTICAL COMPANY LIMITED (JP) 2005-02-24 US disclosed
EP-1471056-A1 PROCESS FOR PRODUCING FUSED IMIDAZOLE COMPOUND, REFORMATSKY REAGENT IN STABLE FORM, AND PROCESS FOR PRODUCING THE SAME Takeda Chemical Industries, Ltd. (JP) 2004-10-27 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160244454-A1 PRODUCTION METHOD OF IMIDAZOLE DERIVATIVES GRIK4, PPIP5K2, IP6K2 ACSS2 4012/4885CYP17A1 953/4885CYP3A4 11/4885
US-10005780-B2 Production method of imidazole derivatives GRIK4, PPIP5K2, IP6K2 ACSS2 4012/4885CYP17A1 953/4885CYP3A4 11/4885
US-20120077985-A1 PROCESS FOR PRODUCING FUSED IMIDAZOLE COMPOUND, REFORMATSKY REAGENT IN STABLE FORM, AND PROCESS FOR PRODUCING THE SAME CYP17A1, HSD17B7, HSD17B1 ACSS2 1983/4885CYP17A1 1/4885CYP3A4 136/4885
US-20140100373-A1 PRODUCTION METHOD OF IMIDAZOLE DERIVATIVES GRIK4, PPIP5K2, IP6K2 ACSS2 4012/4885CYP17A1 953/4885CYP3A4 11/4885
US-20050043544-A1 Process for producing fused imidazole compound, reformatsky reagent in stable form, and process for producing the same CYP17A1, HSD17B7, HSD17B1 ACSS2 1989/4885CYP17A1 1/4885CYP3A4 135/4885
US-20100105922-A1 PROCESS FOR PRODUCING FUSED IMIDAZOLE COMPOUND, REFORMATSKY REAGENT IN STABLE FORM, AND PROCESS FOR PRODUCING THE SAME CYP17A1, HSD17B7, HSD17B1 ACSS2 1983/4885CYP17A1 1/4885CYP3A4 136/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.