SCHEMBL31357193

SCHEMBL31357193

FC(F)(F)c1ccccc1C=S

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NFKB1 P19838 1/20 0.52
GRIN2D O15399 2/20 0.47
GRIN3B O60391 2/20 0.47
GRIN1 Q05586 2/20 0.47
GRIN2A Q12879 2/20 0.47
GRIN2B Q13224 2/20 0.47
GRIN2C Q14957 2/20 0.47
GRIN3A Q8TCU5 2/20 0.47
TNF P01375 2/20 0.46
IL6 P05231 1/20 0.46
MYC P01106 1/20 0.44
MAX P61244 1/20 0.44
MAOB P27338 4/20 0.43
P4HB P07237 1/20 0.42
ABCG2 Q9UNQ0 1/20 0.42
LMNA P02545 1/20 0.41
ALDH1A1 P00352 2/20 0.40
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40
KDM4E B2RXH2 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2154641 1.00 NFKB1 (0.52) NFKB1GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL2494559 0.80 NFKB1 (0.55) NFKB1GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL323188 0.78 NFKB1 (0.53) NFKB1GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL3647881 0.78 NFKB1 (0.53) NFKB1GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL637114 0.78 NFKB1 (0.53) NFKB1GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL5286607 0.76 NFKB1 (0.52) NFKB1GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL67207 0.76 NFKB1 (0.57) NFKB1GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL5544458 0.76 NFKB1 (0.52) NFKB1GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL5544464 0.76 NFKB1 (0.52) NFKB1GRIN2DGRIN3BGRIN1GRIN2A
SCHEMBL5868149 0.76 ALDH1A1 (0.44) NFKB1GRIN2DGRIN3BGRIN1GRIN2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119335814-A Coating material for optical lithography, resist material, and pattern forming method 信越化学工业株式会社 2025-01-21 CN disclosed