SCHEMBL31362014

SCHEMBL31362014

CCCCc1ccc([Si](OC)(OC)OOC)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 2/20 0.41
CA1 P00915 1/20 0.41
ALDH1A1 P00352 2/20 0.40
HSD17B10 Q99714 2/20 0.40
HPGD P15428 1/20 0.40
SMN1; SMN2 Q16637 2/20 0.39
ESR1 P03372 2/20 0.38
ADRA2A P08913 2/20 0.38
ADORA3 P0DMS8 2/20 0.38
TACR2 P21452 2/20 0.38
SLC6A2 P23975 2/20 0.38
SLC6A4 P31645 2/20 0.38
SLC6A3 Q01959 2/20 0.38
TP53 P04637 2/20 0.38
KDM4E B2RXH2 1/20 0.38
LMNA P02545 1/20 0.38
SHBG P04278 1/20 0.38
CYP3A4 P08684 1/20 0.38
HSPD1 P10809 1/20 0.38
ADRB3 P13945 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2464561 0.89 CA2 (0.46) CA2CA1ALDH1A1HSD17B10HPGD
SCHEMBL5485012 0.84 ALDH1A1 (0.50) CA2ALDH1A1HSD17B10HPGDSMN1; SMN2
SCHEMBL14267367 0.82 HSD17B10 (0.53) ALDH1A1HSD17B10HPGDSMN1; SMN2ESR1
SCHEMBL5490593 0.82 HSD17B10 (0.53) ALDH1A1HSD17B10HPGDSMN1; SMN2ESR1
SCHEMBL5488548 0.77 LPL (0.42) CA2ALDH1A1PLK1NISCHHTR1D
SCHEMBL17684937 0.77 CA2 (0.44) CA2CA1ALDH1A1HSD17B10HPGD
SCHEMBL2953186 0.73 CALM1 (0.35) THRATHRB
SCHEMBL2945374 0.73 CALM1 (0.35) THRATHRB
SCHEMBL83869 0.72 CA2 (0.65) CA2CA1ALDH1A1HSD17B10HPGD
SCHEMBL7609465 0.71 ALDH1A1 (0.48) CA2ALDH1A1HSD17B10HPGDSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119045280-A Negative photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 武汉柔显科技股份有限公司 2024-11-29 CN disclosed