SCHEMBL2945374

SCHEMBL2945374

CO[Si](OC)(OC)c1ccc(CCCBr)cc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CALM1 P0DP23 1/20 0.35
SIRT2 Q8IXJ6 1/20 0.33
THRA P10827 1/20 0.33
THRB P10828 1/20 0.33
CYP4A11 Q02928 2/20 0.33
CYP4F2 P78329 1/20 0.32
IGF1R P08069 1/20 0.32
ALOX15 P16050 1/20 0.32
TDP1 Q9NUW8 1/20 0.31
PDPK1 O15530 1/20 0.31
TAAR1 Q96RJ0 1/20 0.31
ALOX5 P09917 1/20 0.30
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30
TUBB4A P04350 1/20 0.30
TUBB P07437 1/20 0.30
TUBA3C P0DPH7 1/20 0.30
TUBA1B P68363 1/20 0.30
TUBA4A P68366 1/20 0.30
TUBB4B P68371 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2946272 0.88 TDP1 (0.43) TDP1TAAR1MEN1KMT2ATUBB4A
SCHEMBL2464561 0.82 CA2 (0.46) THRATHRB
SCHEMBL2952443 0.81 THRA (0.34) CALM1THRATHRB
SCHEMBL5485012 0.81 ALDH1A1 (0.50) MEN1KMT2A
SCHEMBL2953186 0.81 CALM1 (0.35) CALM1THRATHRBCYP4A11CYP4F2
SCHEMBL2954747 0.79 TRPA1 (0.39)
SCHEMBL5490593 0.79 HSD17B10 (0.53) MEN1KMT2A
SCHEMBL14267367 0.79 HSD17B10 (0.53) MEN1KMT2A
SCHEMBL5488548 0.78 LPL (0.42) THRB
SCHEMBL2954273 0.78 TAAR1 (0.33) CALM1TAAR1TUBB4ATUBBTUBA3C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7759406-B2 Process for producing polysilsesquioxane graft polymer, pressure-sensitive adhesive, and pressure-sensitive adhesive sheet LINTEC CORPORATION (JP) 2010-07-20 US disclosed
US-20080051487-A1 Process for Producing Polysilsesquioxane Graft Polymer, Pressure-Sensitive Adhesive, and Pressure-Sensitive Adhesive Sheet LINTEC CORPORATION (JP) 2008-02-28 US disclosed