Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PAM | P19021 | 1/20 | 0.38 |
| ▸ | SLC6A3 | Q01959 | 4/20 | 0.35 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.35 |
| ▸ | NAAA | Q02083 | 2/20 | 0.35 |
| ▸ | MAOB | P27338 | 1/20 | 0.34 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.33 |
| ▸ | PER2 | O15055 | 1/20 | 0.32 |
| ▸ | CRY1 | Q16526 | 1/20 | 0.32 |
| ▸ | CRY2 | Q49AN0 | 1/20 | 0.32 |
| ▸ | MMP1 | P03956 | 1/20 | 0.32 |
| ▸ | MMP2 | P08253 | 1/20 | 0.32 |
| ▸ | MMP9 | P14780 | 1/20 | 0.32 |
| ▸ | MMP12 | P39900 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Styrene SCHEMBL4939721 | 0.80 | SLC6A3 (0.38) | SLC6A3SLC6A4PER2CRY1CRY2 | |
| SCHEMBL908295 | 0.77 | MGLL (0.52) | PAMMAOB | |
| Styrene SCHEMBL6439835 | 0.73 | MGLL (0.48) | PAMMAOB | |
| SCHEMBL1792779 | 0.71 | MEN1 (0.55) | PAMMAOB | |
| Maleic Acid SCHEMBL7519144 | 0.71 | MGLL (0.48) | PAM | |
| SCHEMBL18036722 | 0.70 | PAM (0.49) | PAMMAOBMMP1MMP2MMP9 | |
| SCHEMBL5608312 | 0.70 | PAM (0.59) | PAMMAOBMMP1MMP2MMP9 | |
| SCHEMBL3627784 | 0.70 | ALDH1A1 (0.50) | PAMNAAAMAOB | |
| SCHEMBL2490104 | 0.70 | PAM (0.51) | PAMMAOBMMP1MMP2MMP9 | |
| SCHEMBL409074 | 0.70 | PAM (0.51) | PAMNAAAMAOBMMP1MMP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8288072-B2 | Antireflection film; fast etching speed whcih reduces deformation; accuracy; 2,3-epoxypropyl methacrylate ester-styrene copolymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-16 | — | — | US | disclosed |
| US-7687228-B2 | Antireflection film composition and patterning process using the same | SHIN ETSU CHEMICAL CO., LTD. (JP) | 2010-03-30 | — | — | US | disclosed |
| US-20080220381-A1 | Antireflection film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-11 | — | — | US | disclosed |