SCHEMBL31474464

SCHEMBL31474464

CC(C)(C)Oc1cccc([I+]c2ccccc2)c1

nearest known ligand 0.40

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 1/20 0.40
CETP P11597 1/20 0.34
CA4 P22748 1/20 0.32
PRKDC P78527 1/20 0.31
KDM1A O60341 2/20 0.31
MAOA P21397 1/20 0.31
MAOB P27338 1/20 0.31
PPARG P37231 1/20 0.31
PPARA Q07869 1/20 0.31
SLC5A1 P13866 1/20 0.30
LTA4H P09960 1/20 0.30
TSHR P16473 1/20 0.30
KDM4E B2RXH2 1/20 0.30
MEN1 O00255 1/20 0.30
ALDH1A1 P00352 1/20 0.30
HPGD P15428 1/20 0.30
KMT2A Q03164 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31474501 0.94 KIF11 (0.40) KIF11CETPPRKDCKDM4EMEN1
SCHEMBL248257 0.82 KIF11 (0.40) KIF11CA4KDM1APPARGPPARA
SCHEMBL260934 0.77 KIF11 (0.47) KIF11CETPPRKDCMAOBPPARG
SCHEMBL10405698 0.75 CA4 (0.48) KIF11CA4PPARGPPARALTA4H
SCHEMBL93074 0.75 CA4 (0.48) KIF11CA4PPARGPPARALTA4H
SCHEMBL12250910 0.75 KIF11 (0.43) KIF11MAOALTA4HKDM4EMEN1
SCHEMBL30777597 0.75 KIF11 (0.43) KIF11MAOALTA4HKDM4EMEN1
SCHEMBL30516325 0.74 LTA4H (0.55) MAOAMAOBLTA4HTSHRKDM4E
SCHEMBL7270832 0.73 SLC6A2 (0.37) KIF11PPARGPPARAKDM4EMEN1
Hydrochloric Acid SCHEMBL2153998 0.73 KIF11 (0.39) KIF11CETPCA4PPARGPPARA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119827495-A Method for testing alkali purity, alkali strength and alkali residue by using photoetching machine 上海微悦芯材新材料有限责任公司 2025-04-15 CN disclosed
CN-119827496-A Method for testing acid strength and acid production efficiency by using photoetching machine and application 上海微悦芯材新材料有限责任公司 2025-04-15 CN disclosed