SCHEMBL31474501

SCHEMBL31474501

CC(C)(C)Oc1cccc([I+]c2cccc(OC(C)(C)C)c2)c1

nearest known ligand 0.40

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 1/20 0.40
PRKDC P78527 1/20 0.33
KDM4E B2RXH2 1/20 0.32
MEN1 O00255 1/20 0.32
ALDH1A1 P00352 1/20 0.32
HPGD P15428 1/20 0.32
KMT2A Q03164 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
CETP P11597 1/20 0.32
HTR2A P28223 2/20 0.31
HTR2C P28335 2/20 0.31
HTR2B P41595 2/20 0.31
KCNH2 Q12809 1/20 0.31
ABL1 P00519 1/20 0.31
RIPK1 Q13546 1/20 0.30
ACHE P22303 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31474464 0.94 KIF11 (0.40) KIF11PRKDCKDM4EMEN1ALDH1A1
SCHEMBL260934 0.82 KIF11 (0.47) KIF11PRKDCKDM4EMEN1ALDH1A1
SCHEMBL2092198 0.76 KIF11 (0.43) KIF11PRKDCKDM4EMEN1ALDH1A1
SCHEMBL248257 0.75 KIF11 (0.40) KIF11MEN1ALDH1A1KMT2AKCNH2
Hydrochloric Acid SCHEMBL11058894 0.74 ACHE (0.52) KDM4EMEN1ALDH1A1KMT2AHTR2A
SCHEMBL1802320 0.74 CYP3A4 (0.53) KIF11ALDH1A1ABL1ACHE
SCHEMBL7386225 0.74 ACHE (0.58) KIF11ALDH1A1NPSR1ACHE
SCHEMBL678558 0.74 ACHE (0.52) KDM4EMEN1ALDH1A1HPGDKMT2A
SCHEMBL7270832 0.73 SLC6A2 (0.37) KIF11KDM4EMEN1KMT2AABL1
SCHEMBL1802316 0.72 KIF11 (0.44) KIF11PRKDCKDM4EMEN1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119827495-A Method for testing alkali purity, alkali strength and alkali residue by using photoetching machine 上海微悦芯材新材料有限责任公司 2025-04-15 CN disclosed
CN-119827496-A Method for testing acid strength and acid production efficiency by using photoetching machine and application 上海微悦芯材新材料有限责任公司 2025-04-15 CN disclosed