SCHEMBL3178989

SCHEMBL3178989

CCCC1=CC(=O)N(CCC)C1=O

nearest known ligand 0.34

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 4/20 0.34
PTGS1 P23219 3/20 0.34
PTGS2 P35354 3/20 0.34
FAAH O00519 1/20 0.34
GMNN O75496 1/20 0.32
ALDH1A1 P00352 1/20 0.32
LMNA P02545 1/20 0.32
MAPT P10636 1/20 0.32
THPO P40225 1/20 0.32
BLM P54132 1/20 0.32
PMP22 Q01453 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
CISD1 Q9NZ45 2/20 0.31
DRD3 P35462 1/20 0.30
TOP2A P11388 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24939685 0.83 ALDH1A1 (0.47) PTGS1PTGS2ALDH1A1LMNAMAPT
SCHEMBL20466834 0.81 MGLL (0.42) MGLLPTGS1PTGS2FAAHALDH1A1
SCHEMBL21082746 0.79 LMNA (0.33) PTGS2ALDH1A1LMNABLM
SCHEMBL505900 0.79 PTGS2 (0.52) MGLLPTGS1PTGS2FAAHALDH1A1
SCHEMBL23519914 0.79 MGLL (0.33) MGLLPTGS1PTGS2FAAHGMNN
SCHEMBL28287275 0.78
SCHEMBL7934344 0.77 PTGS1 (0.41) MGLLPTGS1PTGS2MAPTDRD3
SCHEMBL2786847 0.75 PTGS1 (0.36) MGLLPTGS1PTGS2FAAHGMNN
SCHEMBL24939793 0.74 TSHR (0.37) ALDH1A1LMNAMAPT
SCHEMBL3469706 0.73 RGS4 (0.50) MGLLPTGS1PTGS2FAAHGMNN

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1051665-B1 PHOTOPOLYMERIZATION COMPOSITIONS INCLUDING MALEIMIDES AND PROCESSES FOR USING THE SAME ALBEMARLE CORP (US) 2006-07-12 EP claimed
US-7649027-B2 having juts via photopolymerization in supercritical carbon dioxide; calcining KANSAI PAINT CO., LTD. (JP) 2010-01-19 US disclosed
US-20090023830-A1 POLYMER AND PROCESS FOR PRODUCING POLYMER KANSAI PAINT CO., LTD. (JP) 2009-01-22 US disclosed
EP-1698647-A1 POLYMER AND PROCESS FOR PRODUCING POLYMER KANSAI PAINT CO., LTD. (JP) 2006-09-06 EP disclosed
US-7081486-B2 Method of producing polymer SHIZUOKA UNIVERSITY (JP) 2006-07-25 US disclosed
EP-1598374-A1 METHOD OF PRODUCING POLYMER Japan as represented by President of Shizuoka University (JP) 2005-11-23 EP disclosed
US-20050143481-A1 Method of producing polymer KANSAI PAINT CO., LTD. (JP) 2005-06-30 US disclosed