SCHEMBL3182708

SCHEMBL3182708

CC(C)(C)Oc1ccc(S(OS(=O)(=O)c2c(C(F)(F)F)c(C(F)(F)F)c(C(F)(F)F)c(C(F)(F)F)c2C(F)(F)F)(c2ccccc2)c2ccccc2)c(OC(C)(C)C)c1

nearest known ligand 0.32

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 2/20 0.32
ABCC9 O60706 2/20 0.31
ABCC8 Q09428 2/20 0.31
KCNJ11 Q14654 2/20 0.31
KCNJ8 Q15842 2/20 0.31
PPARA Q07869 1/20 0.31
PTGES2 Q9H7Z7 1/20 0.30
KIF11 P52732 1/20 0.30
TDP1 Q9NUW8 1/20 0.30
NR3C1 P04150 1/20 0.30
PGR P06401 1/20 0.30
AR P10275 1/20 0.30
ESR2 Q92731 1/20 0.30
PTGS1 P23219 1/20 0.30
PTGS2 P35354 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3195099 0.88 HSD11B1 (0.32) HSD11B1ABCC9ABCC8KCNJ11KCNJ8
SCHEMBL3195821 0.87 PPARA (0.31) PPARAKIF11TDP1
SCHEMBL3181687 0.87 HSD11B1 (0.32) HSD11B1PTGES2NR3C1PGRAR
SCHEMBL3193905 0.86 PKM (0.32) ABCC9ABCC8KCNJ11KCNJ8PPARA
SCHEMBL3203865 0.85 HSD11B1 (0.37) HSD11B1NR3C1PGRARESR2
SCHEMBL3183411 0.83 HSD11B1 (0.33) HSD11B1PTGES2NR3C1PGRAR
SCHEMBL3194025 0.83 FFAR1 (0.35) HSD11B1TDP1PTGS2
SCHEMBL3194619 0.83 ABCB11 (0.36) HSD11B1PTGES2NR3C1PGRAR
SCHEMBL3191828 0.82 HTR6 (0.33) HSD11B1
SCHEMBL3203126 0.81 NR3C1 (0.32) HSD11B1ABCC9ABCC8KCNJ11KCNJ8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
US-20100028800-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-02-04 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed